1
Hiroshi Tanabe, Hiroshi Yamamoto, Kengo Fukuyu, Osamu Onitsuka: System and process for fabricating an organic electroluminescent display device. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 17, 2000: US06132280 (110 worldwide citation)

The invention provides an organic EL display device fabrication system comprising a loading side normal-pressure delivery chamber 11 including a first substrate delivery means 61 for delivering a substrate with no film formed thereon, and a loading chamber 21 connected thereto for introducing the su ...


2
Toshimichi Ishida, Yuichiro Yamada, Takahiro Takisawa, Hiroshi Tanabe: Plasma processing apparatus. Matsushita Electric Industrial, Price Gess & Ubell, June 16, 1998: US05766364 (91 worldwide citation)

Generated heat is effectively dissipated to prevent thermal deformation of a gas ejector plate in a plasma processing apparatus which is capable of processing a substrate of large scale. A temperature controlling plate 106 and heat conductor 109 are fixedly disposed on the upper electrode-cum-gas ej ...


3
Seigo Togashi, Etsuo Yamamoto, Katsumi Aota, Hiroshi Tanabe, Kanetaka Sekiguchi, Kazuaki Sorimachi: Flat panel display device having on-screen data input function. Citizen Watch, Jordan and Hamburg, April 7, 1987: US04655552 (82 worldwide citation)

An "active matrix" type of liquid crystal matrix display panel, in which diodes are employed as switching elements coupled to each liquid crystal display element, photo-sensing elements such as photo-diodes are formed upon the display panel to enable data input to the panel by variation of the elect ...


4
Hiroshi Tanabe, Tomoyuki Akashi, Yoshimi Watabe: S system for the formation of a silicon thin film and a semiconductor-insulating film interface. NEC Corporation, Sumitomo Heavy, Anelva Corporation, Hayes Soloway P C, March 1, 2005: US06861614 (79 worldwide citation)

In a semiconductor thin film forming system for modifying a predetermined region of a semiconductor thin film by exposing the semiconductor thin film to a projected light patterned through a pattern formed on a photo mask, the system includes a mechanism (opt20′) for uniformizing the light for expos ...


5
Hiroshi Tanabe, Etsuo Yamamoto, Seigo Togashi, Kanetaka Sekiguchi, Katsumi Aota, Kazuaki Sorimachi: Method of making a liquid crystal display with color filters. Citizen Watch, Koda and Androlia, June 16, 1987: US04673253 (66 worldwide citation)

A liquid crystal display device having a color filter comprises a liquid crystal shutter device, at least one color filter layer formed on one surface of the liquid crystal shutter device, and at least one diffusion preventing layer for protecting the color filter layer. The color filter layer is pr ...


6
Hiroshi Tanabe: Method for manufacturing a thin film transistor having a forward staggered structure. NEC Corporation, Sughrue Mion Zinn Macpeak & Seas, April 30, 1996: US05512494 (56 worldwide citation)

A thin film transistor having a staggered structure and manufactured by the method of the invention comprises a first amorphous silicon film of a uniform thickness including source and drain regions, a second amorphous semiconductor film acting as a channel layer, a gate insulating film and a gate e ...


7
Masatoshi Nakayama, Kunihiro Ueda, Toshihiko Ishida, Hiroshi Tanabe: Molds having wear resistant release coatings. TDK Corporation, Fish & Richardson, May 12, 1992: US05112025 (53 worldwide citation)

A mold including a cavity the inner surface of which is at least partly coated with a layer selected from a diamond-like film and layers of fluorine and fluorine compounds. The mold is manufactured by a method which comprises placing at least a part of the mold which constitutes the surface portion ...


8
Shigeyuki Yamamoto, Yuichiro Yamada, Ryuzoh Hohchin, Hiroshi Tanabe, Tomohiro Okumura: Plasma CVD system. Matsushita Electric Industrial, Wenderoth Lind & Ponack, December 13, 1994: US05372648 (43 worldwide citation)

A plasma CVD system has a processing chamber having a thin film forming section, and a transfer section communicating with the thin film forming section through a connecting opening. The system includes a thin film forming device, located in the thin film forming section, for producing plasma to for ...


9
Hiroshi Tanabe, Katsuhisa Yuda, Hiroshi Okumura, Yoshinobu Sato: Thin film transistor. NEC Corporation, Foley & Lardner, December 7, 1999: US05998838 (40 worldwide citation)

In a thin film transistor, a first insulating film on a silicon layer formed in an island on a substrate is smaller in thickness than the silicon layer so that the stepped island edges is gentle in slope to facilitate covering the island with a second insulating film. This reduces occurrence of gate ...


10
Kazuaki Sorimachi, Hiroshi Tanabe, Katsumi Aota, Kanetaka Sekiguchi, Seigo Togashi, Etsuo Yamamoto: Liquid crystal color display panels. Citizen Watch, Koda and Androlia, September 9, 1986: US04610509 (39 worldwide citation)

In a liquid crystal color display panel comprising a color filter layer superposed on one surface of a liquid crystal shutter device for transmitting or intercepting light by the application of a voltage across electrode groups. This color filter layer is formed of photosensitive emulsion layers whi ...