1
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima: Exposure method and exposure apparatus. Hitachi, Antonelli Terry & Wands, October 13, 1987: US04699505 (33 worldwide citation)

The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pa ...


2
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima: Exposure method and exposure apparatus. Hitachi, Antonelli Terry Stout & Kraus, June 18, 1991: US05025284 (28 worldwide citation)

The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pa ...


3
Hiroshi Nishizuka, Susumu Komoriya, Koyo Morita, Takayoshi Osakaya: Projection aligner and method of positioning a wafer. Hitachi, Craig and Antonelli, November 3, 1981: US04298273 (22 worldwide citation)

A wafer projection aligner comprises an optical system for projecting a radiation pattern onto a surface of a semiconductor wafer and a wafer position setting apparatus for positioning the wafer at a position within a focal depth of the optical system for allowing printing of a fine pattern on the w ...


4
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner. Hitachi, Hitachi Ome Electronic, Antonelli Terry & Wands, July 1, 1986: US04598197 (20 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...


5
Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira: Wafer and method of working the same. Hitachi, Antonelli Terry & Wands, November 8, 1988: US04783225 (15 worldwide citation)

A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer ...


6
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner with a sensor for monitoring light quantity. Hitachi, Hitachi Tokyo Electronics, Antonelli Terry & Wands, October 20, 1987: US04701608 (12 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...


7
Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima: Exposure method and exposure apparatus. Hitachi, Antonelli Terry Stout & Kraus, November 27, 1990: US04974018 (11 worldwide citation)

The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pa ...


8
Susumu Komoriya, Koyo Morita, Hiroshi Nishizuka, Hisashi Maejima: Method of and apparatus for aligning photomask. Hitachi, Craig & Antonelli, August 19, 1980: US04218136 (9 worldwide citation)

A method of making a mask and a wafer intimately contact each other by means of such a mask aligning apparatus comprising a base having a chamber, a piston apparatus movable up and down in the chamber, a wafer chuck provided at one end of the piston apparatus and adapted to fix the wafer, means for ...


9
Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira: Method of producing a wafer having a curved notch. Hitachi, Antonelli Terry Stout & Kraus, January 18, 1994: US05279992 (7 worldwide citation)

A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer ...


10
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner method utilizing monitoring of light quantity. Hitachi, Hitachi Ome Electronic Co, Antonelli Terry & Wands, October 25, 1988: US04780606 (6 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...