1
Hiroyuki Obata, Takashi Aono, Hiroshi Mohri, Masato Koike, Hideaki Amano, Norikazu Saito, Makoto Matsuo, Minoru Utsumi, Chihaya Ogusu, Shunsuke Mukasa, Yoshiaki Kudo: Method for recording and reproducing information, apparatus therefor and recording medium. Dai Nippon Printing, Armstrong Westerman Hattori McLeland & Naughton, June 10, 1997: US05638103 (146 worldwide citation)

In the information recording an reproducing method and apparatus according to the present invention, picture image information is recorded as an analog quantity or a digital quantity on an information carrying medium in a planar manner at a high density, charge potential is read for outputting elect ...


2
Makoto Matsuo, Minoru Utsumi, Chihaya Ogusu, Shunsuke Mukasa, Yoshiaki Kudo, Hiroyuki Obata, Takashi Aono, Hiroshi Mohri, Masato Koike, Hideaki Amano, Norikazu Saito: Method for recording and reproducing information, apparatus therefor and recording medium. Dai Nippon Printing, Nikaido Marmelstein Murray & Oram, November 3, 1992: US05161233 (55 worldwide citation)

In the information recording an reproducing method and apparatus according to the present invention, a piece of picture image information is recorded as an analog quantity or a digital quantity an information carrying medium in a planar manner at a high density, charge potential is read for outputti ...


3
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same. Dai Nippon Printing, Mitsubishi Electric Corporation, Sughrue Mion Zinn Macpeak & Seas, July 23, 1996: US05538816 (29 worldwide citation)

A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used f ...


4
Kazuo Kishida, Akira Hasegawa, Hiroshi Mohri: Multi-stage sequentially produced polymer composition. Mitsubishi Rayon Co, Oblon Fisher Spivak McClelland & Maier, November 6, 1979: US04173600 (14 worldwide citation)

A multi-stage sequentially produced polymer structure composition, comprising: an innermost layer (A), and successively seed polymerized thereupon an elastic polymer layer (B), an outermost layer (C) and at least one intermediate layer (D), said layer (A) which has a glass transition temperature (Tg ...


5
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas, March 25, 1997: US05614335 (10 worldwide citation)

The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmitta ...


6
Toshifumi Yokoyama, Koichi Mikami, Chiaki Hatsuda, Hiroshi Mohri: Phase shift mask and method of producing the same. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas PLLC, September 22, 1998: US05811208 (10 worldwide citation)

A phase shift mask, e.g. a halftone phase shift mask, which need not to form an ultra-fine pattern and is capable of suppressing during exposure the occurrence of a sub-peak of light intensity, which has an adverse effect on the image formation, and which has a light-blocking pattern with a reduced ...


7
Makoto Matsuo, Minoru Utsumi, Chihaya Ogusu, Shunsuke Mukasa, Yoshiaki Kudo, Hiroyuki Obata, Takashi Aono, Hiroshi Mohri, Masato Koike, Hideaki Amano, Norikazu Saito: Color imaging system with selectively openable optical shutter. Dai Nippon Printing, Armstrong Westerman Hattori McLeland & Naughton, November 9, 1999: US05983057 (9 worldwide citation)

In the information recording an reproducing method and apparatus according to the present invention, a piece of picture image information is recorded as an analog quantity or a digital quantity an information carrying medium in a planar manner at a high density, charge potential is read for outputti ...


8
Hiroyuki Miyashita, Masahiro Takahashi, Hiroshi Mohri: Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide. Dai Nippon Printing, Dellett and Walters, January 10, 1995: US05380608 (9 worldwide citation)

The invention is directed to a phase shift photomask for which a film made of a material capable of providing an etching stopper layer that excels in etching selectivity and can interrupt etching surely and automatically, and provides a phase shift photomask at least comprising a substrate 30 and a ...


9
Kazuo Kishida, Hiroshi Mohri: Process for producing impact resistant resins. Mitsubishi Rayon, Oblon Fisher Spivak McClelland & Maier, December 11, 1984: US04487890 (9 worldwide citation)

A process for producing an impact resistant graft polymer which comprises first polymerizing a portion of monomer mixture (b) consisting of specified unsaturated acid, alkyl acrylate having C.sub.1 -C.sub.12 alkyl and other copolymerizable monomer (said portion of monomer mixture (b) does not contai ...


10
Hiroshi Mohri, Keiji Hashimoto, Masahiro Takahashi, Wataru Goto, Yukio Iimura: Photomask blank and phase shift photomask. Dai Nippon Printing, Dellett and Walters, May 30, 1995: US05419988 (8 worldwide citation)

A phase shift photomask and a photomask blank used to produce the same. A dry etching stopper layer, which is disposed between a substrate and a light-shielding layer or between the substrate and a phase shifter layer, is made of either a film mainly composed of tin oxide nitride, which has high etc ...