1
Katsuyuki Yamada, Hiroko Iwasaki, Yukio Ide, Makoto Harigaya, Yoshiyuki Kageyama, Hiroshi Deguchi, Masaetsu Takahashi, Yoshitaka Hayashi: Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium. Ricoh Company, Cooper & Dunham, August 28, 2001: US06280684 (217 worldwide citation)

A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom. %) of &agr;, &bgr;, &ggr; and &dgr; thereof being in the relationship of ...


2
Yukio Ide, Hiroko Iwasaki, Yoshiyuki Kageyama, Yujiro Kaneko, Katsuyuki Yamada, Michiaki Shinotsuka, Makoto Harigaya, Hiroshi Deguchi: Sputtering target. Ricoh Company, Cooper & Dunham, April 7, 1998: US05736657 (37 worldwide citation)

A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom. %) of .alpha., .beta., .gamma. and .delta. thereof being in the relationship of 0.5.ltoreq..alpha.<8, 5.ltoreq..beta..ltoreq.23, 17.ltoreq..gamma..ltoreq.38, ...


3
Yoshiyuki Kageyama, Seiichi Ohseto, Kenji Kameyama, Hiroshi Deguchi: Thin film electroluminescence device. Ricoh Company, Oblon Spivak McClelland Maier & Neustadt, December 4, 1990: US04975338 (31 worldwide citation)

A thin film EL device is disclosed which comprises (a) a substrate, (b) a transparent electrode layer formed on the substrate, (c) one or more insulating layers formed on the transparent electrode layer, with at least one of the insulating layers comprising a crystalline nitride, (d) an electrolumin ...


4
Michiaki Shinotsuka, Hajime Yuzurihara, Hiroshi Deguchi, Hiroko Tashiro: Phase-change medium usable in phase-difference tracking. Ricoh Company, Oblon Spivak McClelland Maier & Neustadt P C, July 30, 2002: US06426936 (30 worldwide citation)

A product for recording information by use of laser light includes a recording layer being able to change between an amorphous state and a crystalline state so as to record information, the recording layer having a thickness falling within a first range defined relative to a wavelength of the laser ...


5
Osamu Nonoyama, Yukio Ide, Makoto Harigaya, Yoshiyuki Kageyama, Hiroshi Deguchi, Katsuyuki Yamada, Masaetsu Takahashi, Hiroko Iwasaki: Recording and simultaneous verifying method of phase-changing type of information recording medium. Ricoh Company, Cooper & Dunham, July 8, 1997: US05646924 (29 worldwide citation)

An intensity of light reflected on a phase-changing type of information recording medium is changed since unrecorded and recorded portions of the recording medium have different phase states so that reflectivities of the unrecorded and recorded portions are different from each other. Such an intensi ...


6
Hajime Yuzurihara, Hiroshi Deguchi, Michiaki Shinotsuka, Takashi Shibaguchi, Makoto Harigaya, Mikio Kinoshita, Yoshiyuki Kageyama, Michiharu Abe: Phase-change optical recording medium. Ricoh Company, Cooper & Dunham, August 1, 2000: US06096398 (26 worldwide citation)

A phase-change optical recording medium has a substrate, and a lower heat-resistant protective layer, a recording layer capable of recording and erasing information by utilizing changes in the phase of a phase-change recording material in the recording layer, an upper heat-resistant protective layer ...


7
Katsuyuki Yamada, Hiroko Iwasaki, Yukio Ide, Makoto Harigaya, Yoshiyuki Kageyama, Hiroshi Deguchi, Masaetsu Takahashi, Yoshitaka Hayashi: Sputtering target for producing optical recording medium. Ricoh Company, Cooper & Dunham, July 28, 1998: US05785828 (23 worldwide citation)

A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom.%) of .alpha., .beta., .gamma.and .delta.thereof being in the relationship ...


8
Katsuyuki Yamada, Hiroko Iwasaki, Yukio Ide, Makoto Harigaya, Yoshiyuki Kageyama, Hiroshi Deguchi, Masaetsu Takahashi, Yoshitaka Hayashi: Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium. Ricoh Company, Cooper & Dunham, October 3, 2000: US06127016 (22 worldwide citation)

A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elemets Ag, In, Te and Sb with the respective atomic percent (atom. %) of .alpha., .beta., .gamma. and .delta. thereof being in the relationsh ...


9
Hajime Yuzurihara, Hiroko Tashiro, Hiroshi Deguchi: Optical information recording medium. Ricoh Company, Cooper & Dunham, January 23, 2001: US06177167 (21 worldwide citation)

An optical information recording medium includes a first dielectric protective layer, a recording layer provided on the first dielectric protective layer, including a material represented by a chemical formula of Ag&agr;In&bgr;Sb&ggr;Te&dgr;, wherein &agr;, &bgr;, &ggr; and &dgr; respectively repres ...


10
Yukio Ide, Hiroko Iwasaki, Yoshiyuki Kageyama, Yujiro Kaneko, Katsuyuki Yamada, Michiaki Shinotsuka, Makoto Harigaya, Hiroshi Deguchi: Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of forming recording layer for the optical recording medium. Ricoh Company, Cooper & Dunham, November 20, 2001: US06319368 (20 worldwide citation)

A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom. %) of &agr;, &bgr;, &ggr; and &dgr; thereof being in the relationship of 0.5≦&agr;<8, 5≦&bgr;≦23, 17≦&ggr;≦38, 32≦&dgr;≦73, &agr;≦&bgr ...



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