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Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 10, 2006: US07119874 (104 worldwide citation)

A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid sea ...


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Bernardus Antonius Johannes Luttikhuis, Henrikus Herman Marie Cox, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot: Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, January 27, 2009: US07483120 (76 worldwide citation)

A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associ ...


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Erik Roelof Loopstra, Henrikus Herman Marie Cox, Jeroen Johannes Sophia Maria Mertens, Wilhelmus Franciscus Johannes Simons, Paul Petrus Joannes Berkvens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 4, 2010: US07710540 (64 worldwide citation)

A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target p ...


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Wilhelmus Franciscus Johannes Simons, Henrikus Herman Marie Cox, Sven Antoin Johan Hol: Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 17, 2007: US07205741 (11 worldwide citation)

A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic ...


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Sven Antoin Johan Hol, Henrikus Herman Marie Cox, Hernes Jacobs, Patricia Vreugdewater, Koen Jacobus Johannes Marie Zaal: Lithographic apparatus, Lorentz actuator, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 5, 2006: US07145269 (11 worldwide citation)

A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric cur ...


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Ramidin Izair Kamidi, Henrikus Herman Marie Cox, Ronald Casper Kunst, Youssef Karel Maria De Vos: Stage system and lithographic apparatus comprising such stage system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 24, 2010: US07782446 (10 worldwide citation)

A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respec ...