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Van Der Pasch Engelbertus Antonius Fransiscus, Eussen Emiel Jozef Melanie, Hendriks Stefan Gertrud Marie, Loopstra Erik R, Vink Jacob W, Catharina Maria Beerens Ruud Antonius, Schijvenaars Lodewijk Alexander, Van Zutphen Tom: Lithographic apparatus and sensor calibration method. Asml Netherlands, February 5, 2009: JP2009-027141 (1 worldwide citation)

PROBLEM TO BE SOLVED: To prevent vibration of a grating generated by reception of vibration or other mechanical disturbances by a reference structure, innaccuracy in the displacement of the grating in an encoder measurement system, and an reading error from an encoder caused thereby.SOLUTION: An aux ...


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Van Der Pasch Engelbertus Anto, Eussen Emiel Jozef Melanie, Hendriks Stefan Gertrud Marie, Loopstra Erik Roelof, Vink Jacob Willem, Beerens Ruud Antonius Catharina Maria, Schijvenaars Lodewijk Alexander, Van Zutphen Tom: Lithographic apparatus and sensor calibration method. Asml Netherlands, wangbei bei, November 12, 2008: CN200810096275

A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a ...


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Hendriks Stefan Gertrud Marie, Mattaar Thomas Augustus, Leenheers Gerardus Jacobus Cornelis Catharina Maria: System and method for moving an object employing piezo actuators. Asml Netherlands, March 1, 2006: TWI250676

A piezo actuator system, is presented herein. A piezo actuator system comprises a number of piezo actuators which may lengthen and shear. Using the lengthening and shearing, the piezo actuator system grips and moves an object in response to a first and a second control signal, respectively. The poss ...


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Van Der Pasch Engelbertus Antonius Fransiscus, Eussen Emiel Jozef Melanie, Hendriks Stefan Gertrud Marie, Loopstra Erik Roelof, Vink Jacob Willem, Beerens Ruud Antonius Catharina Maria, Schijvenaars Lodewijk Alexander, Van Zutphen Tom: Lithographic apparatus and sensor calibration method for measuring the location of grating. Asml Netherlands, November 12, 2008: KR1020080042343

PURPOSE: The measurement accuracy of an encoder system for measuring is increased by correcting the reading value of the encoder system about a positional deviation of grating. The influence of vibration or disorder can be reduced. CONSTITUTION: Provided is the method for correcting the secondary se ...


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Hendriks Stefan Gertrud Marie, Mattaar Thomas Augustus, Leenheers Gerardus Jacobus Cornelis Catharina Maria: System and method for moving an object employing piezo actuators. Asml Netherlands, October 1, 2005: TW200532955

A piezo actuator system, is presented herein. A piezo actuator system comprises a number of piezo actuators which may lengthen and shear. Using the lengthening and shearing, the piezo actuator system grips and moves an object in response to a first and a second control signal, respectively. The poss ...


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Hendriks Stefan Gertrud Marie, Mattaar Thomas Augustus, Leenheers Gerardus Jacobus Cornelis Catharina Maria: System and method for moving object employing piezo actuators to perform slow shuffle sequence. Asml Netherlands, June 21, 2005: KR1020040105581

PURPOSE: A piezo actuator system is provided to perform a slow shuffle sequence which is a relatively slowly performed shuffle sequence, while the linear shear sequence may be performed simultaneously, to prevent any dead time during movement. CONSTITUTION: A piezo actuator system is configured to p ...


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