1
Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


2
Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


3
Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas: Cleanup method for optics in immersion lithography. Nikon Corporation, Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas, COSTANTINO Mario A, October 28, 2004: WO/2004/093130 (561 worldwide citation)

An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reti ...


4
Novak W Thomas, Hazelton Andrew J, Watson Douglas C: Liquid jet and recovery system for immersion lithography. Nikon Corporation, Novak W Thomas, Hazelton Andrew J, Watson Douglas C, OLIFF PO BOX 19928 ALEXANDRIA VIRGINIA 22320 UNITED STATES OF AMERICA, October 28, 2004: WO/2004/092830 (557 worldwide citation)

A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selective ...


5
Coon Derek, Hazelton Andrew J: Immersion lithography fluid control system. Nikon Corporation, Coon Derek, Hazelton Andrew J, COSTANTINO Mario A, October 28, 2004: WO/2004/093159 (541 worldwide citation)

A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as ...


6
Hazelton Andrew J, Takaiwa Hiroaki: Wafer table for immersion lithography. Nikon Corporation, Hazelton Andrew J, Takaiwa Hiroaki, COSTANTINO Mario A, February 3, 2005: WO/2005/010611 (268 worldwide citation)

Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly ...


7
Tanaka Keiichi, Binnard Mike, Martinek Robert, Hazelton Andrew J: Stage device and aligner. Nikon, January 17, 2003: JP2003-017404 (16 worldwide citation)

PROBLEM TO BE SOLVED: To provide a stage device which can move two stages by foot print, whose degree is similar to the stage device of single-stage type.SOLUTION: A first stage ST1 supporting a first table TB1 via a first micro drive device is driven by a first drive device in the direction of an X ...


8
Hazelton Andrew J, Novak W Thomas, Phillips Alton H, Watson Douglas C: Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system. Nippon Kogaku, January 2, 2004: EP1376192-A2 (14 worldwide citation)

Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 ...


9
Hazelton Andrew J, Phillips Alton H, Novak Thomas, Watson Douglas C: Reflective projection optical system with discrete actuator. Nikon, February 19, 2004: JP2004-056125 (7 worldwide citation)

PROBLEM TO BE SOLVED: To provide a system which operates in an EUV wavelength region and controls one or more elements of adaptive optics to optimize optical performance of the system and makes aberration minimum and a measuring system suitable for controlling elements of adaptive optics.SOLUTION: T ...


10
Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi: Fine stage z support apparatus. Nikon Corporation, Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi, GARRETT Arthur S, May 18, 2006: WO/2006/052855 (2 worldwide citation)

An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.