1
Harry Sewell: Method and system for dual reticle image exposure. ASML Holding, Sterne Kessler Goldstein & Fox PLLC, August 26, 2003: US06611316 (289 worldwide citation)

The present invention provides a method and system for simultaneously imaging at least two reticles onto a substrate. According to the present invention, the wafer is passed through the exposure sequence once with images from the reticles being exposed simultaneously onto the wafer. The throughput o ...


2
Harry Sewell: Immersion photolithography system and method using inverted wafer-projection optics interface. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, October 26, 2004: US06809794 (137 worldwide citation)

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection o ...


3
Nabila Baba Ali, Justin Kreuzer, Harry Sewell: Lithographic printing with polarized light. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, November 4, 2008: US07445883 (38 worldwide citation)

The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresis ...


4
Harry Sewell: Immersion photolithography system and method using inverted wafer-projection optics interface. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, December 27, 2005: US06980277 (28 worldwide citation)

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection o ...


5
Michael M Albert, Harry Sewell: Patterned grid element polarizer. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, December 4, 2007: US07304719 (21 worldwide citation)

The invention relates to a patterned grid polarizer for use in lithography, comprising a substrate that is transparent to ultraviolet (UV) light; and an array of elements patterned on the substrate, wherein the elements polarize UV light. The array of elements can be patterned to produce tangentiall ...


6
Harry Sewell: Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, May 4, 2004: US06731374 (21 worldwide citation)

The present invention is a catadiopiric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer optical group are placed on the same ...


7
Andrew W McCullough, Christopher Mason, Louis Markoya, Harry Sewell: Use of multiple reticles in lithographic printing tools. Sterne Kessler Goldstein & Fox P L L C, September 30, 2003: US06628372 (21 worldwide citation)

A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans t ...


8
Harry Sewell: System and method for patterning both sides of a substrate utilizing imprint lithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, April 29, 2008: US07363854 (19 worldwide citation)

Provided are a method and system for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. A method includes deforming the surfaces of the first and second imprint stamps to produce respective first and second deformed surfaces, each having an arc therein. A Press ...


9
Andrew Alfred Turnbull, Harry Sewell: Pyroelectric detector comprising nucleating material wettable by aqueous solution of pyroelectric material. U S Philips Corporation, Frank R Trifari, Carl P Steinhauser, October 11, 1977: US04053806 (13 worldwide citation)

A pyroelectric detector employing a substrate supporting a thin, i.e., 0.5 to 5 .mu.m thick, solid layer of pyroelectric material with an intermediate layer of nucleating material, i.e., a material which is wettable by a solution of the pyroelectric material so that an adherent continuous layer is f ...


10
Nabila Baba Ali, Justin Kreuzer, Harry Sewell: Lithographic printing with polarized light. ASML Holding, Sterne Kressler Goldstein & Fox P L L C, August 15, 2006: US07090964 (11 worldwide citation)

The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresis ...