1
Harada Yuji, Hatakeyama Jun, Yoshihara Takao, Kusaki Wataru, Kobayashi Tomohiro, Hasegawa Koji, Maeda Kazunori: Polymer compound, resist material, and pattern-forming method. Shin Etsu Chem, May 15, 2008: JP2008-111103 (160 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist material suitable for good liquid-immersion lithography, and to provide a pattern-forming method.SOLUTION: The polymer compound contains general formulas in the figure, and has 1,000-500,000 Mw (weight average molecular weight). In the formulas, R1a, R1b and ...


2
Hatakeyama Jun, Yoshihara Takao, Harada Yuji, Kusaki Wataru: Resist material and patterning process using the same. Shin Etsu Chem, May 29, 2008: JP2008-122932 (125 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist material having good barrier performance to water, capable of suppressing dissolution of a resist film thereof in water, having a large backward contact angle to water, capable of eliminating liquid droplet residues, having excellent process applicability wi ...


3
Kaneko Tatsushi, Hatakeyama Jun, Harada Yuji: Resist material and pattern formation method using the same. Shin Etsu Chem, November 15, 2007: JP2007-297590 (80 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist material that has good barrier performance to water, enables to keep a resist composition from eluting to water, has a high receding contact angle to water, is useful for an immersion lithography due to excellent process applicability without requiring a pro ...


4
Kobayashi Tomohiro, Hatakeyama Jun, Harada Yuji: Resist material and patterning method using the same. Shin Etsu Chem, October 9, 2008: JP2008-239918 (53 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist material and a patterning method which achieves improved rectangular shapes of patterns and mask fidelity, at the same time prevents the occurrence of mixing layers of resist layers and protection layers, when the protection layers are formed on the resist i ...


5
Hatakeyama Jun, Watanabe Takeshi, Harada Yuji: Resist protective coating material and patterning process. Shin Etsu Chem, February 1, 2007: JP2007-025634 (32 worldwide citation)

PROBLEM TO BE SOLVED: To provide a protective coating material effective for liquid immersion lithography, the material which facilitates preferable liquid immersion lithography, can be removed simultaneously with a photoresist layer during development, and has excellent process compatibility, and t ...


6
Hatakeyama Jun, Harada Yuji: Resist protective film material and pattern forming method. Shin Etsu Chem, December 6, 2007: JP2007-316448 (32 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist protective film material with which even when a protective film is formed on a photoresist film, a resist pattern having good rectangularity can be obtained more reliably.SOLUTION: The resist protective film material for forming a protective film on a photor ...


7
Hatakeyama Jun, Harada Yuji, Watanabe Takeshi: Resist protective film material and pattern forming method. Shin Etsu Chem, January 10, 2008: JP2008-003569 (30 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist protective film material capable of securely obtaining a rectangular satisfactory resist pattern, even when a protective film is formed on a photoresist film.SOLUTION: The resist protective film material for forming the protective film on the photoresist fil ...


8
Hatakeyama Jun, Hasegawa Koji, Watanabe Takeshi, Harada Yuji: Resist composition and patterning process. Shin Etsu Chem, May 7, 2009: JP2009-098638 (23 worldwide citation)

PROBLEM TO BE SOLVED: To provide a resist composition preventing degradation of a pattern profile.SOLUTION: A resist composition comprises a polymer compound as base resin which improves or reduces its alkali solubility under the action of an acid, and a polymer compound as an additive copolymer com ...


9
Harada Yuji, Watanabe Jun, Hatakeyama Jun: Fluorine-containing polymers, resist compositions and patterning process. Shinetsu Chemical Co, August 22, 2001: EP1126322-A2 (22 worldwide citation)

Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.


10
Hatakeyama Jun, Harada Yuji: Patterning method and resist overcoat material to be used for the same. Shin Etsu Chem, April 6, 2006: JP2006-091798 (21 worldwide citation)

PROBLEM TO BE SOLVED: To enables excellent immersion lithogoraphy through a simplified process and to obtain a rectangular pattern which has high sensitivity through exposure to light of 180 to 250 nm in wavelength from an ArF excimer laser.SOLUTION: In a patterning method by immersion lithography, ...