1
Han Westendorp, Hans Meiling, John W Vanderpot, Donald Berrian: Apparatus and method for igniting plasma in a process module. TEL America, Lahive & Cockfield, October 15, 1996: US05565036 (32 worldwide citation)

The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the type which have an electrode pair and a radiofrequency generator connected to one electrode. Gas is in ...


2
Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects. ASML Netherlands, Pillsbury Winthrop, April 20, 2004: US06724460 (28 worldwide citation)

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the ...


3
Han Westendorp, Hans Meiling, John William Vanderpot, Donald Berrian: Apparatus and method for igniting plasma in a process module. TEL America, Lahive & Cockfield, August 4, 1998: US05789867 (24 worldwide citation)

The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the type which have an electrode pair and a radiofrequency generator connected to one electrode. Gas is in ...


4
Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, August 24, 2004: US06781673 (17 worldwide citation)

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...


5
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, December 7, 2004: US06828569 (14 worldwide citation)

Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected fro ...


6
Hubert Adriaan Van Mierlo, Gert Jan Heerens, Hans Meiling, Antonius Gerardus Theodorus Maria Bastein, Jacques Cor Johan Van der Donck, Hedser Van Brug: Lithographic apparatus and method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 21, 2009: US07522263 (8 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultravio ...


7
Jan Evert Van Der Werf, Erik Roelof Loopstra, Hans Meiling, Johannes Hubertus Josephina Moors, Martinus Hendrikus Antonius Leenders: Device manufacturing method, device manufactured thereby and a mask for use in the method. ASML Netherlands, Pillsbury Winthrop, April 12, 2005: US06879374 (7 worldwide citation)

A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection s ...


8
Lucas Henricus Johannes Stevens, Martinus Hendrikus Antonius Leenders, Hans Meiling, Johannes Hubertus Josephina Moors: Lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 22, 2006: US07095479 (6 worldwide citation)

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The app ...


9
Jan Evert Van Der Werf, Erik Roelof Loopstra, Hans Meiling, Johannes Hubertus Josephina Moors, Martinus Hendrikus Antonius Leenders: Device manufacturing method, device manufactured thereby and a mask for use in the method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 17, 2009: US07492443 (2 worldwide citation)

A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection s ...


10
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07115886 (2 worldwide citation)

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the ...