1

2

3

4
Jozef Augustinus Maria Alberti, Gerardus Petrus Matthijs Van Nunen, Frans Erik Groensmit, Rene Theodorus Petrus Compen: Method of transferring a substrate, transfer system and lithographic projection apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 27, 2011: US08086348 (4 worldwide citation)

A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provide ...


5
Jozef Augustinus Maria Alberti, Gerardus Petrus Matthijs Van Nunen, Frans Erik Groensmit, Rene Theodorus Petrus Compen, Abraham Alexander Soethoudt: Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 3, 2012: US08149387 (3 worldwide citation)

A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of the plurality of burls on the sur ...


6

7
Rene Theodorus Petrus Compen, Gerardus Petrus Matthijs Van Nunen, Martijn Houben, Marco Adrianus Peter Van Den Heuvel: Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 26, 2013: US08384882 (1 worldwide citation)

A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table a ...


8

9

10