1
Salvatore A Celestino, Georges J Gorin, Stephen E Hilliker, Gary B Powell: Plasma reactor apparatus. Tegal Corporation, Paul F Wille, April 1, 1986: US04579618 (272 worldwide citation)

Plasma processing is accomplished with an improved single electrode reactor apparatus. High and low frequency power supplies are coupled to the single electrode to provide increased process flexibility, control and residue removal. A multi-stage passive filter network is disclosed which performs the ...


2
Gary B Powell, David J Drage, Tony Sie: Temperature controlled chuck for elevated temperature etch processing. Matrix Integrated Systems, November 20, 1990: US04971653 (46 worldwide citation)

A parallel plate plasma type etching apparatus is provided with a temperature control chuck 44 so that elevated substrate temperatures are controlled. With an elevated substrate temperature, the reaction rate is increased. With positive temperature control, the likelihood of damage to the semiconduc ...


3
Gary B Powell: Method of plasma etching with parallel plate reactor having a grid. Matrix Integrated Systems, Lisa & Lisa, May 14, 1991: US05015331 (30 worldwide citation)

A parallel plate reactor having a grounded grid disposed between an RF powered electrode and a grounded electrode upon which a substrate is disposed. A method of utilizing the above apparatus consists of etching the substrate using a composition of 30-100% NF.sub.3 (nitrogen trifluoride) at 25 SCCM ...


4
Gary B Powell, Herbert E Litvak: Method and apparatus for chemical monitoring. Lightwind Corporation, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, July 4, 2006: US07072028 (8 worldwide citation)

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...


5
Gary B Powell: Parallel plate reactor and method of use. Matrix Integrated Systems, Donald J Lisa, May 11, 1993: US05209803 (7 worldwide citation)

A parallel plate reactor having a grounded grid disposed between an RF powered electrode and a grounded electrode upon which a substrate is disposed. A method of utilizing the above apparatus consists of etching the substrate using a composition of 30-100% NF.sub.3 (nitrogen trifluoride) at 25 SCCM ...


6
Gary B Powell, Herbert E Litvak: Method and apparatus for chemical monitoring. Lightwind Corporation, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, November 25, 2008: US07456939 (1 worldwide citation)

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...


7
Gary B Powell, Herbert E Litvak: Method and apparatus for chemical monitoring. Lightwind Corporation, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, August 25, 2009: US07580119 (1 worldwide citation)

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...


8
Gary B Powell, Herbert E Litvak: Method and apparatus for chemical monitoring. Lightwind Corporation, Haynes Beffel & Wolfeld, March 3, 2005: US20050046825-A1

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...


9
Gary B Powell, Herbert E Litvak: Method and Apparatus for Chemical Monitoring. Lightwind Corporation, Haynes Beffel & Wolfeld, March 22, 2007: US20070064227-A1

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...


10
Gary B Powell, Herbert E Litvak: Method and apparatus for chemical monitoring. Lightwind Corporation, Haynes Beffel & Wolfeld, March 19, 2009: US20090075403-A1

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presen ...