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Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens: Lithographic apparatus and method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 22, 2013: US08564763 (19 worldwide citation)

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.


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Jozef Petrus Henricus Benschop, Hans Butler, Nicolaas Rudolf Kemper, Bartholomeus Hendricus Koek, Frits Van Der Meulen, Harmen Klaas Van Der Schoot: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 20, 2010: US07760324 (10 worldwide citation)

An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame whi ...


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Henrikus Herman Marie Cox, Petrus Marinus Christianus Maria Van Den Biggelaar, Frits Van Der Meulen, Franciscus Andreas Cornelis Johannes Spanjers, Jan Gerard Cornelis Van Der Toorn, Arend Jan Migchelbrink: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 13, 2007: US07295283 (8 worldwide citation)

A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the ...


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Pieter Renaat Maria Hennus, Frits Van Der Meulen, Joost Jeroen Ottens, Peter Paul Steijaert, Hubert Matthieu Richard Steijns, Peter Smits: Substrate support and lithographic process. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 7, 2010: US07791709 (7 worldwide citation)

A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport ...


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Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Frits Van Der Meulen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 27, 2010: US07705962 (7 worldwide citation)

A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liq ...