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Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 27, 2007: US07196768 (9 worldwide citation)

A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined tra ...


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Boris Menchtchikov, Frederik Eduard De Jong: Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 9, 2008: US07462429 (5 worldwide citation)

The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to ...


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Igor Matheus Petronella Aarts, Engelbertus Antonius Fransiscus Van Der Pasch, Johan Hendrik Geerke, Frederik Eduard De Jong, Marc Van De Grift: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 11, 2012: US08264671 (2 worldwide citation)

A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended patt ...


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Maurice Wijckmans, Martinus Agnes Willem Cuijpers, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Theodorus Petrus Maria Cadee, Frederik Eduard De Jong, Wilhelmus Franciscus Johannes Simons, Edwin Augustinus Matheus Van Gompel, Martin Frans Pierre Smeets, Rob Jansen, Gerardus Adrianus Antonius Maria Kusters, Martijn Van Baren: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 16, 2014: US08913228 (2 worldwide citation)

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to co ...


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Koen Jacobus Johannes Maria Zaal, Antonius Johannes De Kort, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Hermen Folken Pen: Lithographic method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 9, 2008: US07423725 (1 worldwide citation)

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.


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Koen Jacobus Johannes Maria Zaal, Antonius Johannes De Kort, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Hermen Folken Pen: Method of calibrating a lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 16, 2008: US07426011 (1 worldwide citation)

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.


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Koen Jacobus Johannes Maria Zaal, Johannes Henricus Wilhelmus Jacobs, Erik Roelof Loopstra, Joost Jeroen Ottens, Frederik Eduard De Jong: Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 29, 2010: US07746447 (1 worldwide citation)

An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so ...


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Boris Menchtchikov, Frederik Eduard De Jong: Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 9, 2008: US07462430 (1 worldwide citation)

The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to ...