1
Franken Dominicus Jacobus, Jacobs Franciscus Mathijs, Van Kimmenade Johannes Mathijs, Van Dijk Cornelis Dionysius, Van Eijk Jan: Lithographic device with a suspended object table.. Philips, Asm Lithography, August 12, 1992: EP0498496-A1 (17 worldwide citation)

A lithographic device with a lithographic irradiation system (1, 13) which is fastened near a lower side to a mounting member (5) of a frame (7). The device is provided with a unit (65) which is formed by a positioning device (37), with which an object table (21) arranged below the irradiation syste ...


2
Cox Hendrikus Herman Marie, Auer Frank, Van Der Wijst Marc Wilhelmus Maria, Jansen Bastiaan Stephanus Hendrikus, Franken Dominicus Jacobus Petrus Adrianus: Lithographic apparatus and method of manufacturing device. Asml Netherlands, July 18, 2003: JP2003-203860 (11 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing devices.SOLUTION: Undesirable vibrations of optical elements 10, 50, and 60 are reduced in the projection system of a lithographic projection apparatus, using reaction masses 14, 54, and 64 and actuators 15, 55, ...


3
Bleeker Arno Jan, Franken Dominicus Jacobus Petr, Kochersperger Peter C, Troost Kars Zeger: Lithographic apparatus and device manufacturing method. Asml Netherlands, Asml Holdings, March 23, 2005: EP1517188-A2 (10 worldwide citation)

One or more programmable patterning means are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning means to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternativ ...


4
Cox Hendrikus Herman Marie, Auer Frank, Van Der Wijst Marc Wilhelmus M, Jansen Bastiaan Stephanus Hend, Franken Dominicus Jacobus Petr: Lithographic apparatus and device manufacturing method. Asml Netherlands, June 25, 2003: EP1321823-A2 (9 worldwide citation)

A reaction mass 14; 54; 64 and an actuator 15; 55; 65 are used to reduce unwanted vibrations of an optical element 10; 50; 60 in the projection system of a lithographic projection apparatus. The reaction mass 14; 54; 64 may be mechanically connected only to the optical element 50; 60 or may be compl ...


5
Bleeker Arno Jan, Franken Dominicus Jacobus Petrus Adrianus, Kochersperger Peter C, Troost Kars Zeger: Lithographic apparatus and device manufacturing method. Asml Netherlands, Asml Holdings, May 26, 2005: JP2005-136387 (8 worldwide citation)

PROBLEM TO BE SOLVED: To provide a structure, in which one or more patterning arrays are provided so as to reduce the nonflatness of the patterning arrays in a lithographic apparatus.SOLUTION: One or more programmable patterning arrays are mounted to a mounting plate via height-adjustable mounting s ...


6
Box Wilhelmus Josephus, Van Dijsseldonk Antonius Johannes Josephus, Franken Dominicus Jacobus Petrus Adrianus, Leenders Martinus Hendrikus Antonius, Loopstra Erik Roelof, Smits Josephus Jacobus, Van Der Wijst Marc Wilhelmus M: Lithography equipment, method of manufacturing device, and device manufactured thereby. Asml Netherlands, December 2, 2004: JP2004-343116 (7 worldwide citation)

PROBLEM TO BE SOLVED: To provide lithography equipment which makes temperature stability of a projection system surer by active heat transport, while minimizing impact of mechanical vibration by the heat transport.SOLUTION: In the lithography projection equipment, the projection system comprises one ...


7
Franken Dominicus Jacobus Petrus Adrianus: Lithography equipment and device manufacturing method. Asml Netherlands, April 28, 2005: JP2005-117048 (6 worldwide citation)

PROBLEM TO BE SOLVED: To restrain thermal deformation impact on the reflecting surface of a reflector assembly contained in a pattern providing means, which is caused by absorbed incidence radiation.SOLUTION: The lithography equipment of this invention comprises a substrate table that holds a substr ...


8
Cox Henrikus Herman Marie, Franken Dominicus Jacobus Petrus Adrianus, Kemper Nicolaas Rudolf, Van Der Pasch Engelbertus Antonius F, Verbunt Martijn Johannes, Van Den Wildenberg Lambertus A: Lithographic apparatus and device manufacturing method. Asml Netherlands, December 2, 2004: JP2004-343078 (5 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projecting system which can keep optical elements at correct positions with extremely high accuracy.SOLUTION: In a projecting system using EUV, the position of a mirror is not measured and controlled relative to a reference holder but are measured and controlled re ...


9
Loopstra Erik Roelof, Franken Dominicus Jacobus Petrus Adrianus, Smits Josephus Jacobus, Van Dijsseldonk Antonius Johannes Josephus, Moors Johannes Hubertus Josephina, Hof Albrecht, Maul Gunter, Muhlbeyer Michael, Mehlkopp Klaus: Lithographic apparatus and device manufacturing method. Asml Netherlands, Carl Zeiss Semiconductor Manufacturing Technologies, May 30, 2003: JP2003-158070 (4 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection system which realizes high positioning precision necessary for an EUV lithographic apparatus and does not need to cool a frame to which an optical element is fixed, and to perform predictive temperature compensation positioning control which is complicat ...


10
Van Dijsseldonk Antonius Johannes Josephus, Franken Dominicus Jacobus Petrus Adrianus, Jansen Bastiaan Stephanus Hendrikus, de Jongh Robertus Johannes Marinus, Van Der Wijst Marc Wilhelmus Maria, Kleijn Jacob: Lithographic apparatus and method of manufacturing device. Asml Netherlands, July 6, 2006: JP2006-179930 (4 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a projection system including a movable optical element.SOLUTION: The movable optical element M4 can affect the position quantity of a radiation beam projected by the projection system by being displaced. A control device Con which ...