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Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 26, 2010: US07652746 (11 worldwide citation)

Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation ...


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Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 6, 2010: US07751027 (9 worldwide citation)

Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation ...


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Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert Jan Gerardus Johannes Thomas Brands, Koen Steffens: Lithographic apparatus having parts with a coated film adhered thereto. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 14, 2009: US07561250 (4 worldwide citation)

A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a subst ...


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Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, November 10, 2015: US09182678 (3 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the subs ...


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Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Franciscus Johannes Joseph Janssen, Ivo Adam Johannes Thomas: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 31, 2012: US08233134 (3 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the subs ...


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Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maria Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 11, 2013: US08462314 (2 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projecti ...