1
Dennis M Hausmann, Adrianne K Tipton, Patrick A Van Cleemput, Bunsen Nie, Francisco J Juarez, Teresa Pong: Properties of a silica thin film produced by a rapid vapor deposition (RVD) process. Novellus Systems, Beyer Weaver & Thomas, March 15, 2005: US06867152 (40 worldwide citation)

A rapid vapor deposition (RVD) method conformally deposits a dielectric material on small features of a substrate surface. The resulting dielectric film has a low dielectric constant, low wet etch rate, low film shrinkage and low stress hysteresis, appropriate for various integrated circuit dielectr ...


2
George Thomas, Panya Wongsenakhum, Francisco J Juarez: Hybrid impedance matching for inductively coupled plasma system. Novellus Systems, Weaver Austin Villeneuve & Sampson, July 14, 2015: US09082589 (3 worldwide citation)

In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations, ...


3
George Thomas, Panya Wongsenakhum, Francisco J Juarez: Hybrid impedance matching for inductively coupled plasma system. Lam Research Corporation, Weaver Austin Villeneuve & Sampson, March 13, 2018: US09918376

In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations, ...