1
Robert J Allen, Cam V Endicott, Fook Luen Heng, Jason D Hibbeler, Kevin W McCullen, Rani Narayan, Robert F Walker, Xin Yuan: Technology migration for integrated circuits with radical design restrictions. International Business Machines Corporation, Richard M Kotulak, Hoffman Warnick & D Alessandro, November 27, 2007: US07302651 (175 worldwide citation)

A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. ...


2
Robert J Allen, Michael S Gray, Fook Luen Heng, Jason D Hibbeler, Kevin W McCullen, Rani R Narayan, Robert F Walker, Xin Yuan: Minimum layout perturbation-based artwork legalization with grid constraints for hierarchical designs. International Business Machines Corporation, Richard M Kotulak, Greenblum & Bernstein, January 27, 2009: US07484197 (172 worldwide citation)

A method comprises extracting a hierarchical grid constraint set and modeling one or more critical objects of at least one cell as a variable set. The method further comprises solving a linear programming problem based on the hierarchical grid constraint set with the variable set to provide initial ...


3
Puneet Gupta, Fook Luen Heng, Mark A Lavin: Method of IC fabrication, IC mask fabrication and program product therefor. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Louis J Percello Esq, Brian P Verminski Esq, April 1, 2008: US07353492 (170 worldwide citation)

A method of forming integrated circuit (IC) chip shapes and a method and computer program product for converting an IC design to a mask, e.g., for standard cell design. Individual book/macro physical designs (layouts) are proximity corrected before unnesting and an outer proximity range is determine ...


4
John M Cohn, Fook Luen Heng: Object placement aid. International Business Machines Corporation, Wayne F Reinke, Heslin & Rothenberg, July 9, 1996: US05535134 (60 worldwide citation)

An existing layout is modified to ensure compliance with design rules and any user-defined rules by deriving a horizontal constraint model and a vertical constraint model. For each of the vertical and horizontal orientations in turn, violations of the rules are identified. For each orientation in tu ...


5
Fook Luen Heng, Zhan Chen, Gustavo E Tellez, John Cohn, Rani Narayan: Design rule correction system and method. International Business Machines Corporation, F Chau & Associates, February 13, 2001: US06189132 (55 worldwide citation)

A method of modifying a layout of a plurality of objects in accordance with a plurality of predetermined criteria is presented. An objective function is defined for measuring a location perturbation and a separation perturbation of the objects in the layout. A linear system is defined using linear c ...


6
Fook Luen Heng, Lars W Liebmann: Optimized phase shift design migration. International Business Machines Corporation, H Daniel Schnurmann, Ratner & Prestia, July 4, 2000: US06083275 (51 worldwide citation)

A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using ...


7
John M Cohn, James A Culp, Ulrich A Finkler, Fook Luen Heng, Mark A Lavin, Jin Fuw Lee, Lars W Liebmann, Gregory A Northrop, Nakgeuon Seong, Rama N Singh, Leon Stok, Pieter J Woltgens: Physical design system and method. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Louis J Percello Esq, Brian P Verminski Esq, May 19, 2009: US07536664 (28 worldwide citation)

A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit genera ...


8
Robert J Allen, Fook Luen Heng, Alexey Y Lvov, Kevin W McCullen, Sriram Peri, Gustavo E Tellez: Practical method for hierarchical-preserving layout optimization of integrated circuit layout. International Business Machines Corporation, McGinn & Gibb PLLC, Richard Kotulak Esq, January 10, 2006: US06986109 (19 worldwide citation)

The invention provides a method of modifying a hierarchical integrated circuit layout wherein the locations of hierarchical layout elements are represented with variables and formulae using these variables, which produces a formula-based hierarchical layout. These variables are constrained to be int ...


9
Howard Chen, Katherine V Hawkins, Fook Luen Heng, Louis Hsu, Xu Ouyang: Method to determine the root causes of failure patterns by using spatial correlation of tester data. International Business Machines Corporation, George Willinghan, August Law, March 9, 2010: US07676775 (18 worldwide citation)

A method for determining the root causes of fail patterns in integrated circuit chips is provide wherein a known integrated circuit chip layout is used to identify a plurality of potential defects and a plurality of potential fail patterns in the integrated circuit chip. Correlations between the pot ...


10
Fook Luen Heng, Lars W Liebmann: Integrated lithographic layout optimization. International Business Machines Corporation, Todd M C Li, December 14, 2004: US06832364 (17 worldwide citation)

A method and computer system is described for designing a conflict-free altPSM layout by first constructing a planar interlock graph without predefining phase shift shapes. Feature nodes of the graph represent critical elements, while connection nodes of the graph represent phase shape interactions. ...



Click the thumbnails below to visualize the patent trend.