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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 24, 2013: US08614784 (8 worldwide citation)

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...


2
Raymond Wilhelmus Louis Lafarre, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 2, 2014: US08902400 (2 worldwide citation)

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise ga ...


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Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, December 19, 2017: US09846372

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...


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Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, February 9, 2016: US09256136

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...


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Michel Riepen, Erik Henricus Egidius Catharina Eummelen, Sandra Van Der Graaf, Rogier Hendrikus Magdalena Cortie, Takeshi Kaneko, Nina Vladimirovna Dziomkina, Laurentius Johannes Adrianus Van Bokhoven, Fabrizio Evangelista, David Bessems, Cornelius Maria Rops, Adrianus Marinus Verdonck, Nicolaas Ten Kate: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, April 18, 2017: US09625828

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, i ...


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Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 5, 2016: US09383654

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a sub ...


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Fabrizio Evangelista, Derk Jan Wilfred Klunder, Cornelis Cornelia De Bruijn: Lithographic apparatus, sensor and method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, October 18, 2016: US09470985

A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a subs ...


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Raymond Wilhelmus Louis LAFARRE, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. Asml Netherlands, September 8, 2011: US20110216292-A1

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise ga ...


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Michel RIEPEN, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. Asml Netherlands, April 21, 2011: US20110090472-A1

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...