1
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, June 8, 2010: US07733552 (12 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


2
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, April 24, 2012: US08164815 (4 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


3
Ana Londergan
Khurshid Syed Alam, Evgeni Gousev, Marc Maurice Mignard, David Heald, Ana R Londergan, Philip Don Floyd: Equipment and methods for etching of MEMS. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, September 17, 2013: US08536059 (1 worldwide citation)

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in ...


4
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: Mems cavity-coating layers and methods. Qualcomm Mems Technologies, August 16, 2012: US20120206462-A1

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


5
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: Mems cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, September 30, 2010: US20100245979-A1

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


6
Ana Londergan
Ion Bita, Evgeni Gousev, Ana Londergan, Xiaoming Yan: Etching processes used in mems production. Qualcomm MEMS Technologies, Knobbe Martens Olson & Bear, April 23, 2009: US20090101623-A1

The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. ...


7
Ana Londergan
Khurshid Syed Alam, Evgeni Gousev, Marc Maurice Mignard, David Heald, Ana R Londergan, Philip Don Floyd: Equipment and methods for etching of mems. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, September 2, 2010: US20100219155-A1

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in ...


8
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: Mems cavity-coating layers and methods. QUALCOMM Incorporated, Knobbe Martens Olson & Bear, September 25, 2008: US20080231931-A1

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


9
Xiaoming Yan, Brian Arbuckle, Evgeni Gousev, Ming Hau Tung: Selective etching of MEMS using gaseous halides and reactive co-etchants. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, July 28, 2009: US07566664 (44 worldwide citation)

A method for etching a target material in the presence of a structural material with improved selectivity uses a vapor phase etchant and a co-etchant. Embodiments of the method exhibit improved selectivities of from at least about 2-times to at least about 100-times compared with a similar etching p ...


10
Evgeni Gousev, Gang Xu, Marek Mienko: Interferometric optical display system with broadband characteristics. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, January 5, 2010: US07643203 (33 worldwide citation)

Broad band white color can be achieved in MEMS display devices by incorporating a material having an extinction coefficient (k) below a threshold value for wavelength of light within an operative optical range of the interferometric modulator. One embodiment provides a method of making the MEMS disp ...