1
Werner Tabarelli, Ernst W Lobach: Photolithographic method for the manufacture of integrated circuits. Karl F Ross, August 24, 1982: US04346164 (1003 worldwide citation)

In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous expos ...


2
Werner Tabarelli, Ernst W Lobach: Apparatus for the photolithographic manufacture of integrated circuit elements. Karl F Ross, Herbert Dubno, April 9, 1985: US04509852 (864 worldwide citation)

Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the ...


3
Herbert E Mayer, Ernst W Lobach: Arrangement for projection copying masks on to a work piece. Censor Patent und Versuchs Anstalt, Karl F Ross, November 2, 1982: US04357100 (11 worldwide citation)

An arrangement for projection copying of masks onto a workpiece, in particular onto a semiconductor substrate for producing integrated circuits, wherein the images of the patterns of the masks are formed by a projection lens on a photosensitive layer on the workpiece. The projection lens is complete ...