Erik R Loopstra, Yim Bun P Kwan, Marcel JEH Muitjens, Sonja T De Vrieze Voom: Lithographic projection apparatus having a temperature controlled heat shield. Pillsbury Madison & Sutro, August 16, 2001: US20010013925-A1

In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a te ...



Rogier HM Groeneveld, Erik R Loopstra, Jacobus Burghoorn, Leon M Levasier, Alexander Straaijer: Abbe arm calibration system for use in lithographic apparatus. Asml Netherlands, Pillsbury Winthrop, September 23, 2004: US20040184018-A1

In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting ...

Thomas JM Castenmiller, Andreas BG Ariens, Martinus HH Hoeks, Patrick D Vogelsang, Erik R Loopstra, Yim Bun P Kwan: Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method. Asml Netherlands, Pillsbury Winthrop, October 28, 2004: US20040211921-A1

A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect li ...

Erik R Loopstra: Actuator and transducer. Asml Netherlands, Pillsbury Winthrop, May 20, 2004: US20040095217-A1

An actuator comprises a magnet yoke and a carrier member movable relative to the magnet yoke. The magnet yoke has at least one permanent magnet and the carrier member is positioned in the magnetic field produced by this magnet. The carrier member has an auxiliary magnetic member that produces a rela ...

Jan E Van Der Werf, Mark Kroon, Wilhelmus C Keur, Vadim Y Banine, Hans Van Der Laan, Johannes HJ Moors, Erik R Loopstra: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, October 5, 2006: US20060219931-A1

A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

Erik R Loopstra: Gas flushing system with recovery system for use in lithographic apparatus. Asml Netherlands, Pillsbury Winthrop, August 7, 2003: US20030146396-A1

In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components a ...

Erik R Loopstra, Antonius JJ van Dijsseldonk: Lithographic projection apparatus with positioning system for use with reflectors. Asml Netherlands, Pillsbury Winthrop, September 11, 2003: US20030168615-A1

In a lithographic projection apparatus the positions and/or orientations of reflective optical elements is dynamically controlled. The position of a reflective optical element such as a mirror in an illumination or projection system is first measured using an absolute position sensor mounted on a re ...

Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, December 11, 2003: US20030227605-A1

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...