1
Ivan Louis Berry III, Kyuha Chung, Qingyuan Han, Youfan Liu, Eric Scott Moyer, Michael John Spaulding: High modulus, low dielectric constant coatings. Dow Corning Corporation, Axcelis Technologies, Killworth Gottman Hagan & Schaeff L, June 10, 2003: US06576300 (84 worldwide citation)

Low dielectric constant films with improved elastic modulus. The method of making such coatings involves providing a porous network coating produced from a resin containing at least 2 Si—H groups where the coating has been thermally cured and has a dielectric constant in the range of from about 1.1 ...


2
Kyuha Chung, Eric Scott Moyer, Michael John Spaulding: Method of forming coatings. Dow Corning Corporation, Roger E Gobrogge, Rick D Streu, May 15, 2001: US06231989 (26 worldwide citation)

A coating is formed on a substrate by depositing a solution comprising a resin containing at least 2 Si—H groups and a solvent in a manner in which at least 5 volume % of the solvent remains in the coating after deposition followed by exposing the coating to an environment comprising a basic catalys ...


3
Gregory Scott Becker, Leslie Earl Carpenter II, Russell Keith King, Tetsuyuki Michino, Eric Scott Moyer: Silicone resins and process for synthesis. Dow Corning Corporation, Dow Corning Asia, William F Boley, Rick D Streu, Sharon K Severance, August 28, 2001: US06281285 (16 worldwide citation)

A method for hydrolyzing chlorosilanes having at least three chlorine atoms bonded to each silicon atom to form silicone resins. The method comprises adding at least one of hydridotrichlorosilane, tetrachlorosilane, or organotrichlorosilane to a two-phase mixture comprising a non-polar organic solve ...


4
Sanlin Hu, Eric Scott Moyer, Sheng Wang, David Lee Wyman: Silsesquioxane resin. Dow Corning Corporation, Sharon K Brady, December 1, 2009: US07625687 (9 worldwide citation)

This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for in-corporating the fluorinated or non-fluorinated functi ...


5
Michael L Bradford, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle: Silsesquioxane resins. Dow Corning Corporation, Erika Takeuchi, Sharon K Brady, November 6, 2012: US08304161 (7 worldwide citation)

A silsesquioxane resin comprised of the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m, (HSiO(3-x)/2(OR′)x)n′(MeSiO(3-x)/2(OR′)x)o′(RSiO(3-x)/2(OR′)x)p, (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selecte ...


6
Peng Fei Fu, Eric Scott Moyer: Antireflective coating material. Dow Corning Corporation, Erika Takeuchi, September 11, 2012: US08263312 (4 worldwide citation)

Antireflective coatings comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.01 to 0.99, n has a value of 0.01 to 0.99, p has a value of 0.0 ...


7
Wei Chen, Eric Scott Moyer, Binh Thanh Nguyen, Sheng Wang, Mark A Wanous, Xiaobing Zhou: Polysilane—polysilazane copolymers and methods for their preparation and use. Dow Corning Corporation, Dow Corning Corporation, Claude F Purchase, Erika Takeuchi, February 25, 2014: US08658284 (3 worldwide citation)

A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a≧1, b≧1, and a quantity (a+b)≧2. The polysilane-polysilaz ...


8
Peng Fei Fu, Eric Scott Moyer, Jason D Suhr: Method and materials for double patterning. Dow Corning Corporation, Baltazar Gomez, May 20, 2014: US08728335 (3 worldwide citation)

A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesqui ...


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Gregory Scott Becker, Leslie Earl Carpenter II, Russell Keith King, Tetsuyuki Michino, Eric Scott Moyer, Craig Rollin Yeakle: Process for synthesis of silicone resin. Dow Corning Corporation, Dow Corning Asia, William F Boley, Rick D Streu, Sharon K Severance, May 28, 2002: US06395825 (3 worldwide citation)

A method for hydrolyzing chlorosilanes having at least three chlorine atoms bonded to each silicon atom to form silicone resins. The method comprises adding at least one of hydridotrichlorosilane, tetrachlorosilane, or organotrichlorosilane to a two-phase mixture comprising a non-polar organic solve ...