1
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael L Timmons, Charles J Marsman, Egbert Woelk, Ronald L DiCarlo Jr: Delivery device. Rohm and Haas Electronic Materials, S Matthew Cairns, May 25, 2010: US07722720 (11 worldwide citation)

Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with ...


2
Deodatta Shenai-Khatkhate
Egbert Woelk, Deodatta Vinayak Shenai Khatkhate: Method of depositing germanium-containing films. Rohm and Haas Electronic Materials, S Matthew Cairns, November 28, 2006: US07141488 (9 worldwide citation)

Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.


3
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Egbert Woelk: Organometallic compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, June 24, 2008: US07390360 (4 worldwide citation)

Compositions useful in the manufacture of compound semiconductors are provided. Methods of manufacturing compound semiconductors using these compositions are also provided.


4
Deodatta Shenai-Khatkhate
Egbert Woelk, Deodatta Vinayak Shenai Khatkhate: Germanium compound delivery device. Rohm and Haas Electronic Materials, S Matthew Cairns, Rohm and Haas Electronic Materials, April 5, 2007: US20070077733-A1

Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.


5
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Egbert Woelk: Organometallic compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, Rohm and Haas Electronic Materials, June 1, 2006: US20060115595-A1

Compositions useful in the manufacture of compound semiconductors are provided. Methods of manufacturing compound semiconductors using these compositions are also provided.


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael L Timmons, Charles J Marsman, Egbert Woelk, Ronald L DiCarlo: Delivery device. Rohm and Haas Electronic Materials, S Matthew Cairns, Rohm and Haas Electronic Material, June 8, 2006: US20060121198-A1

Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with ...


8
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Egbert Woelk: Organometallic composition. Rohm and Haas Electronic Materials, Rohm And Haas Electronic Materials, July 5, 2007: US20070154637-A1

Compositions including germanium compounds suitable for use as vapor phase deposition precursors for germanium-containing films are provided. Methods of depositing films containing germanium using such compositions are also provided. Such germanium-containing films are particularly useful in the man ...


9
Deodatta Shenai-Khatkhate
Egbert Woelk, Deodatta Vinayak Shenai Khatkhate, Ronald L Dicarlo: Delivery system. Rohm and Haas Electronic Materials, S Matthew Cairns, Rohm and Haas Electronic Materials, February 23, 2006: US20060037540-A1

Systems for delivering solid organometallic compounds in the vapor phase to reactors are provided. Such systems include a dual-chambered cylinder design for use with a frit of solid organometallic source material for chemical vapor phase deposition systems, and a method for transporting a carrier ga ...


10
Deodatta Shenai-Khatkhate
Egbert Woelk, Deodatta Vinayak Shenai Khatkhate: Germanium compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, Edwards & Angell, October 7, 2004: US20040197945-A1

Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.