1
Edward W Conrad, David P Paul: Method and apparatus for measuring the profile of small repeating lines. International Business Machines Corporation, James M Leas, October 5, 1999: US05963329 (268 worldwide citation)

A method for nondestructively determining the line profile or topographical cross-section of repeating lines on a substrate is provided, including line thickness, line width, and the shape of the line edge. A substrate having a repeating structure, such as a grating, is illuminated with broad-band r ...


2
Orest Bula, Daniel C Cole, Edward W Conrad, William C Leipold: Auto correction of error checked simulated printed images. International Business Machines Corporation, McGinn & Gibb PLLC, Richard M Kotulak Esq, July 23, 2002: US06425112 (197 worldwide citation)

A method and computer system are provided for checking integrated circuit designs for design rule violations. The method may include generating a working design data set, creating a wafer image data set, comparing the wafer image data set to the design rules to produce an error list and automaticall ...


3
Timothy E Neary, Edward W Conrad, Orest Bula: Feedback method to repair phase shift masks. International Business Machines Corporation, Peter W Peterson, Howard J Walter Jr, DeLio & Peterson, January 18, 2000: US06016357 (89 worldwide citation)

A method of repairing a semiconductor phase shift mask comprises first providing a semiconductor mask having a defect and then illuminating the mask to create an aerial image of the mask. Subsequently, the aerial image of the mask is analyzed and the defect in the mask is detected from the aerial im ...


4
Edward W Conrad, James C Douglas, Shawn R Goddard, John S Smyth: System and method of curve fitting. International Business Machines Corporation, Anthony J Canale, December 1, 2009: US07627622 (80 worldwide citation)

The invention relates to fitting a curve to a plurality of data points. A “seed curve” is determined from a first set of data points selected from the plurality of data points. From the remaining data points, data points are individually selected and a determination is made for each selected data po ...


5
Orest Bula, Daniel C Cole, Edward W Conrad, William C Leipold: Error checking of simulated printed images with process window effects included. International Business Machines Corporation, Richard M Kotulak Esq, McGinn & Gibb PLLC, April 16, 2002: US06373975 (47 worldwide citation)

A structure and method for checking semiconductor designs for design rule violations includes generating a predicted printed structure (i.e., an ideal image) based on the semiconductor designs, altering the ideal image to include potential manufacturing variations, thereby producing at least two pro ...


6
Edward D Buker, Edward W Conrad, James M Leas: Metal removal cleaning process and apparatus. International Business Machines Corporation, Richard M Kotulak, November 9, 1999: US05980647 (40 worldwide citation)

A megasonic liquid stream semiconductor wafer cleaning apparatus and method uniformly removes debris from all points on the surface of a semiconductor wafer. The wafer is rotated about a proscribed axis while the means for producing focused megasonic waves and a liquid stream of cleaning fluid is fo ...


7
Edward W Conrad, John S Smyth, Charles A Whiting, David A Ziemer: Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings. International Business Machines Corporation, William D Sabo Esq, McGinn & Gibb PLLC, May 11, 2004: US06735492 (38 worldwide citation)

A system and method of monitoring and predicting tool overlay settings comprise generating current lot information, generating historical data, categorizing (binning) the historical data into discrete exposure field size ranges, and predicting current lot tool overlay settings based on the current l ...


8
James A Bruce, Orest Bula, Edward W Conrad, William C Leipold: Method of etch bias proximity correction. International Business Machines Corporation, Richard M Kotulak, Connolly Bove Lodge & Hutz, May 28, 2002: US06395438 (23 worldwide citation)

A method for including etch bias corrections in pre-processing of integrated circuit design data to compensate for deviations introduced during lithographic printing and etching. The design data is segmented, and etch bias corrections are applied to the segments based on their proximity to adjacent ...


9
Edward W Conrad, Paul D Sonntag, Arthur C Winslow: Dynamic alignment scheme for a photolithography system. International Business Machines Corporation, William D Sabo, March 4, 2003: US06528219 (15 worldwide citation)

Photolithography tools have alignment systems for aligning a level to be printed with a level already on the wafer. Commonly a photolithography tool has several alignment systems Also, wafers may have several alignment marks, and the various alignment systems may be capable of reading several of the ...


10
Ronald E Chappelow, Edward W Conrad: Apparatus for identifying and distinguishing temperature and system induced measuring errors. International Business Machines Corporation, Calfee Halter & Griswold, June 28, 1994: US05325180 (14 worldwide citation)

The present invention provides a device which can identify and measure both thermally induced errors and system induced errors in a measuring system, especially a photolithographic system for processing semiconductor wafers. The system includes a stage having associated therewith a first material ha ...