1
Eaton John K: An electro-osmotic element for an immersion lithography apparatus. Nikon Corporation, Eaton John K, ROEDER Steven G, October 21, 2004: WO/2004/090633 (530 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), an electro-osmotic element (256), and a control system (255). The fluid barrier (254) is positioned near the ...


2
Sogard Michael R, Eaton John K, Suwa Kyoichi, Kobayashi Naoyuki: Precision stage interferometer system with air duct. Nippon Kogaku, April 29, 1998: EP0838728-A2 (7 worldwide citation)

A local gas duct directs a temperature-controlled stream of gas across two perpendicular sets of interferometer beams which are used to measure the two dimension (X-Y) position of a precision stage in e.g. an optical lithography stepper or step and scan system, or in any other precision coordinate m ...


3
Hazelton Andrew J, Tanaka Keiichi, Eaton John K: Exposure device having a planar motor. Nippon Kogaku, Hazelton Andrew J, January 3, 2001: EP1064713-A2

Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic ...


4
Eaton John K, Elkins Christopher J, Burton Tristan M: Method for simulating slurry flow for a grooved polishing pad. Nikon Corporation, Eaton John K, Elkins Christopher J, Burton Tristan M, HOSOE Toshiaki, August 26, 2004: WO/2004/073055

A method for determining the flow of a fluid (60) in a gap (64) between a pad (48) and a substrate (12) includes the step of utilizing a hybrid Navier-Stokes/lubrication formulation to calculate the flow of the fluid (60) in the gap (64) at a plurality of time steps. The gap (64) can be divided into ...


5
Hazelton Andrew J, Tanaka Keiichi, Eaton John K: Exposure device having a planar motor. Nikon Corporation, Hazelton Andrew J, Tanaka Keiichi, Eaton John K, CHUN Debra A, January 20, 2000: WO/2000/003301

Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic ...


6
LO Kin Pong, EATON John K: [fr] DIFFUSEUR POSSÉDANT UN DÉCROCHEMENT FAISANT FACE VERS LARRIÈRE ET À HAUTEUR DE DÉCROCHEMENT VARIABLE, [en] DIFFUSER WITH BACKWARD FACING STEP HAVING VARYING STEP HEIGHT. LO Kin Pong, EATON John K, THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY, SWANSON Erik C, January 31, 2013: WO/2013/016177

[en] A diffuser (30) expanding a gas flow (F) upstream of a heat recovery steam generator (32) of a combined cycle power plant (34). An outer wall (44) of the diffuser includes a smoothly lofted backward facing step (46) effective to fix a location of a flow recirculation bubble (56) under condition ...


7
Eaton John K, Matalanis Claude G: A translating active gurney flap to alleviate aircraft wake vortex hazard. The Board Of Trustees Of The Leland Stanford Junior University, Eaton John K, Matalanis Claude G, LODENKAMPER Robert, May 2, 2008: WO/2008/051293

A wake vortex alleviator is provided. The wake vortex alleviator produces rapid variations in the position of vortices emanating from aerodynamic surfaces by using an active flap (302) that moves span-wise back and forth along the outboard section of the surface. Rapidly moving the flap back and for ...


8
Sogard Michael R, Eaton John K, Suwa Kyoichi, Kobayashi Naoyuki: Gas-circulating system, circulating method of gas and lithography equipment. Nikon, May 22, 1998: JP1998-135132

PROBLEM TO BE SOLVED: To provide a gas-circulating system and a gas-circulating method which can maintain the temperature of gas along an interferometer beam to be constant. SOLUTION: This gas-circulating system is used together with a positioning equipment in a housing which has a movable object 12 ...


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Eaton John K, Elkins Christopher J, Burton Tristan M: Method for simulating slurry flow for a grooved polishing pad. Nikon Corporation, October 19, 2005: KR1020057015047

A method for determining the flow of a fluid (60) in a gap (64) between a pad (48) and a substrate (12) includes the step of utilizing a hybrid Navier-Stokes/lubrication formulation to calculate the flow of the fluid (60) in the gap (64) at a plurality of time steps. The gap (64) can be divided into ...