1
Donis Flagello, John Doering: Gradient immersion lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 11, 2005: US06954256 (183 worldwide citation)

In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is ...


2
Donis Flagello, Kevin Cummings: Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 13, 2005: US06943941 (38 worldwide citation)

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between ...


3
Donis Flagello, Kevin Cummings, Alexander Straaijer: Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 22, 2007: US07221501 (22 worldwide citation)

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between ...


4
Donis Flagello, Kevin Cummings, Alexander Straaijer: Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 31, 2009: US07511884 (15 worldwide citation)

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between ...


5
Robert Socha, Donis Flagello, Steve Hansen: Optimized polarization illumination. ASML Masktools, McDermott Will & Emery, November 6, 2007: US07292315 (15 worldwide citation)

Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determi ...


6
Robert Socha, Donis Flagello, Steve Hansen: Optimized polarization illumination. ASML Masktools, Pillsbury Winthrop Shaw Pittman, May 4, 2010: US07710544 (1 worldwide citation)

Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determi ...


7
Donis Flagello, John Doering: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 26, 2006: US07113259

In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fluid is provided between a substrat ...


8
Robert Socha, Donis Flagello, Steve Hansen: Optimized polarization illumination. ASML Masktools, Pillsbury Winthrop Shaw Pittman, March 12, 2013: US08395757

Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determi ...


9
Donis Flagello, Kevin Cummings, Alexander Straaijer: Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems. Asml Netherlands, Pillsbury Winthrop, September 2, 2004: US20040169924-A1

A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between ...


10
Robert Socha, Donis Flagello, Steve Hansen: Optimized polarization illumination. ASML Masktools, Mcdermott Will & Emery, February 21, 2008: US20080043215-A1

Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determi ...