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Joseph L Adams, Donald F Perry: Method and apparatus for separating and deliquifying liquid slurries. Eileen M McMahon, November 10, 1998: US05833851 (41 worldwide citation)

A screw press separator is provided herein for separating and deliquifying a slurry of solids and liquids e.g., a slurry of manure and water, or any other slurry of similar physical characteristics. The separator includes a cylindrical housing having a slurry inflow port. A cylindrical strainer bask ...


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Kenji Honda, Taishih Maw, Donald F Perry: Photoresist stripping and cleaning compositions. Olin Microelectronic Chemicals, Ohlandt Greeley Ruggiero & Perle, June 2, 1998: US05759973 (11 worldwide citation)

A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic ...


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Ahmad A Naiini, David B Powell, N Jon Metivier, Donald F Perry: Photosensitive resin compositions. Fujifilm Electronic Materials U, Fish & Richardson P C, August 5, 2008: US07407731 (5 worldwide citation)

A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI  wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl ...


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Ahmad A Naiini, David B Powell, N Jon Metivier, Donald F Perry: Novel photosensitive resin compositions. Fujifilm Electronic Materials Usa, Paul D Greeley Esq, Ohlandt Greeley Ruggiero & Perle, September 28, 2006: US20060216641-A1

A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl o ...


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David B Powell, Ahmad A Naiini, N Jon Metivier, Donald F Perry: Pretreatment compositions. Fujifilm Electronic Materials Usa, Paul D Greeley Esq, Ohlandt Greeley Ruggiero & Perle, October 26, 2006: US20060240358-A1

A pretreatment composition for treating a substrate to be subjected to forming a relief pattern thereon by exposure to actinic radiation, the pretreatment composition comprising: (a) at least one compound having Structure VI  wherein, V is selected from CH and N, Y is selected from O and NR3 wherein ...