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Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Radical cleaning arrangement for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 9, 2008: US07462850 (42 worldwide citation)

A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at par ...


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Levinus Pieter Bakker, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Lithographic apparatus, illumination system and debris trapping system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 5, 2006: US07145132 (16 worldwide citation)

A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an ...


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Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 18, 2008: US07453645 (11 worldwide citation)

A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to tran ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Derk Jan Wilfred Klunder: Lithographic apparatus including a cleaning device and method for cleaning an optical element. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 13, 2008: US07372049 (11 worldwide citation)

An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Derk Jan Wilfred Klunder: Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 8, 2008: US07355672 (10 worldwide citation)

A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposi ...


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Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Radiation system and lithographic apparatus. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, February 19, 2008: US07332731 (8 worldwide citation)

A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plates for trapping contaminant materia ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Derk Jan Wilfred Klunder: Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 19, 2008: US07414700 (8 worldwide citation)

A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposi ...


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Johannes Maria Freriks, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 17, 2009: US07504643 (7 worldwide citation)

A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that ...


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