1
Alex Poon, Leonard Kho, Gaurav Keswani, Derek Coon: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, August 7, 2012: US08237911 (26 worldwide citation)

Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate ...


2
Alex Ka Tim Poon, Leonard Wai Fung Kho, Guarav Keswani, Derek Coon: Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool. Nikon Corporation, Oliff & Berridge, November 29, 2011: US08068209 (26 worldwide citation)

An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the oth ...


3
Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani: Apparatus and methods for recovering fluid in immersion lithography. Nikon Corporation, Oliff & Berridge, October 16, 2012: US08289497 (25 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confi ...


4
Alex Poon, Leonard Kho, Gaurav Keswani, Derek Coon, Daishi Tanak: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, March 19, 2013: US08400610 (24 worldwide citation)

Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate ...


5
Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani: Apparatus and methods for recovering fluid in immersion lithography. Nikon Corporation, Oliff, January 13, 2015: US08934080 (24 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confi ...


6
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Derek Coon, Daishi Tanaka: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff, June 3, 2014: US08743343 (23 worldwide citation)

A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element ...


7
Derek Coon, Andrew J Hazelton: Immersion lithography fluid control system that applies force to confine the immersion liquid. Nikon Corporation, Oliff & Berridge, March 4, 2008: US07339650 (22 worldwide citation)

A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to a s ...


8
Arun A Aiyer, Paul Derek Coon, Henry K Chau: CMP variable angle in situ sensor. Nikon Corporation, Skjerven Morrill MacPherson Franklin & Friel, November 17, 1998: US05838448 (21 worldwide citation)

A chemical-mechanical polishing (CMP) optical process monitor apparatus allows in situ measurement of the thickness of a thin film being polished. As the incidence angle of the incident light on the wafer being polished is changed, the reflected intensity of the light from the thin film on the wafer ...


9
Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani, Daishi Tanaka: Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate. Nikon Corporation, Oliff & Berridge, December 17, 2013: US08610873 (18 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surf ...


10
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Derek Coon: Gas curtain type immersion lithography tool using porous material for fluid removal. Nikon Corporation, Oliff & Berridge, August 18, 2009: US07576833 (13 worldwide citation)

A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The ...