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Davis Donald Eugene, Ingham Kenneth Thomas, Nagy Kenneth Joseph: Flywheel shell construction.. Rockwell International, December 8, 1982: EP0066040-A1 (7 worldwide citation)

A method of assembling a flywheel 2 comprising the steps of mounting a removable mandrel 6 about the hub 4 of said flywheel 2, winding a first plurality of resin-impregnated fibers 8 about said mandrel 6 circumferentially with respect to said hub 4, winding a second plurality of resin-impregnated fi ...


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Benjamin Charles Ephraim, Crawford David James, Davis Donald Eugene, Moore Richard David, Ryan Philip Meade, Weber Edward Victor: Positioning and controlling procedure of a workpiece provided with patterns, for example of a mask for manufacturing semi-conductor elements.. Ibm, June 30, 1982: EP0054710-A1 (6 worldwide citation)

1. Method of positioning and inspecting a patterned workpiece, e.g. a mask for manufacturing semiconductor elements, by means of a scanning beam generating different signals for the patterns and for the other workpiece surfaces, with a deflector system connected to a computer-monitored control circu ...


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Davis Donald Eugene, Doran Samuel Kay, Perkins Merlyn Harold, Pfeiffer Hans Christian: Electron beam writing method and system using large range deflection in combination with a continuously moving table.. Ibm, January 4, 1989: EP0297247-A1 (5 worldwide citation)

This system employs writing of lithographic patterns with a shaped electron beam exposure system (10) which minimizes the time wasted by workpiece positional requirements. The writing field contains an array of sub-fields written in a raster sequence. The large width of the writing field (37) provid ...


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Davis Donald Eugene, Weber Edward Victor, Williams Maurice Carmen, Woodard Ollie Clifton: Method for overlay measurement using an electronic beam system as a measuring tool.. Ibm, July 25, 1979: EP0003038-A2 (3 worldwide citation)

A method and apparatus is described for performing automatic overlay measurements on wafers utilized in semiconductor manufacturing. The overlay measurements are made at selected sites on a given wafer where a single bar pattern has been overlaid over a double bar pattern. The position of the single ...


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Davis Donald Eugene: Reticle having a number of subfields.. Ibm, June 28, 1995: EP0660371-A2 (2 worldwide citation)

A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the pattern is carried by a set of apertures area ...


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Davis Donald Eugene, Ho Cecil Tzechor, Lieberman Jon Erik, Pfeiffer Hans Christian, Sturans Maris Andris: Tri-deflection electron beam system.. Ibm, September 26, 1990: EP0389398-A2 (1 worldwide citation)

A three-stage E-beam deflection system employs breaking the entire field to be scanned into clusters and sub-fields. The scanning provided by the first stage of deflection which scans within the entire field is rectilinear and discontinuous with the scan stopping in the center of each of the cluster ...


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Davis Donald Eugene: Procede de protection de surfaces exposees a lerosion. Rockwell International, January 2, 1981: FR2458736-A1 (1 worldwide citation)

L'INVENTION CONCERNE LA PROTECTION DES SURFACES EXPOSEES A DES MILIEUX QUI PROVOQUENT UNE EROSION.ELLE SE RAPPORTE A UN PROCEDE QUI COMPREND L'ENROBAGE DE FIBRES 14 DANS UNE MATIERE DE SUPPORT 16 FORMANT UN LIANT, L'EROSION DU LIANT AFIN QU'IL SOIT EXPOSE A UN FLUIDE CAPABLE DE PROVOQUER UNE EROSION ...


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