1
Tibor Bolom, Stephan Grunow, David Rath, Andrew Herbert Simon: Gap free anchored conductor and dielectric structure and method for fabrication thereof. International Business Machines Corporation, Advanced Micro Devices, Scully Scott Murphy & Presser P C, Todd M C Li Esq, November 4, 2008: US07446036 (30 worldwide citation)

A microelectronic structure and a method for fabricating the microelectronic structure use a dielectric layer that is located and formed upon a first conductor layer. An aperture is located through the dielectric layer. The aperture penetrates vertically into the first conductor layer and extends la ...


2
Bharat Khuti, Clayton Coleman, David Rath, Ernest Rakaczky, Jim Leslie, Juan Peralta, George Simpson: Process control methods and apparatus for intrusion detection, protection and network hardening. Invensys Systems, Nutter McClennen & Fish, David J Powsner, Joshua T Matt, July 20, 2010: US07761923 (29 worldwide citation)

The invention provides an improved network and methods of operation thereof for use in or with process control systems, computer-based manufacturing or production control systems, environmental control systems, industrial control system, and the like (collectively, “control systems”). Those networks ...


3
Emanuel Cooper, Bruce Furman, David Rath: Method for isotropic etching of copper. International Business Machines Corporation, Connolly Bove Lodge & Hutz, Robert M Trepp, June 6, 2006: US07056648 (17 worldwide citation)

Copper and copper alloys are etched to provide uniform and smooth surface by employing an aqueous composition that comprises an oxidant, a mixture of at least one weak complexant and at least one strong complexant for the copper or copper alloy, and water and has a pH of about 6 to about 12 so as to ...


4
Bharat Khuti, Clayton Coleman, David Rath, Ernest Rakaczky, Jim Leslie, Juan Peralta, George Simpson: Process control methods and apparatus for intrusion detection, protection and network hardening. Invensys Systems, Nutter McClennen & Fish, David J Powsner, Joshua T Matt, November 3, 2009: US07614083 (13 worldwide citation)

The invention provides an improved network and methods of operation thereof for use in or with process control systems, computer-based manufacturing or production control systems, environmental control systems, industrial control system, and the like (collectively, “control systems”). Those networks ...


5
Stephan Kudelka, David Rath: Temperature controlled degassification of deionized water for megasonic cleaning of semiconductor wafers. Infineon Technologies North America, Stanton Braden, January 2, 2001: US06167891 (12 worldwide citation)

A system is provided to prepare deionized water having a 100% saturated concentration of a gas, e.g., nitrogen, at a hot temperature, e.g., 50-85° C., and an attendant pressure, e.g., atmospheric pressure, to clean a semiconductor wafer, e.g., of silicon. The gas concentration of deionized water hav ...


6
Stephan Kudelka, David Rath: Temperature controlled gassification of deionized water for megasonic cleaning of semiconductor wafers. Infineon Technologies North America, International Business Machines Corporation, Stanton C Braden Esq, October 2, 2001: US06295998 (7 worldwide citation)

A system is provided to prepare deionized water having a 100% saturated concentration of a gas, e.g., nitrogen, at a hot temperature, e.g., 50-85° C., and an attendant pressure, e.g., atmospheric pressure, to clean a semiconductor wafer, e.g., of silicon. The gas concentration of a first deionized w ...


7
Chih Chao Yang, Shom Ponoth, David Rath, Keith Kwong Hon Wong: Conductor-dielectric structure and method for fabricating. Connolly Bove Lodge & Hutz, May 24, 2007: US20070117377-A1

A conductor-dielectric interconnect structure is fabricated by providing a structure comprising a dielectric layer having a patterned feature therein; depositing a plating seed layer on the dielectric layer in the patterned feature; depositing a sacrificial seed layer on the plating seed layer in th ...


8
Bharat Khuti, Clayton Coleman, David Rath, Ernest Rahaczky, Jim Leslie, Juan Peralta, George Simpson: Process control methods and apparatus for intrusion detection, protection and network hardening. Invensys Systems, Nutter Mcclennen & Fish, December 28, 2006: US20060294579-A1

The invention provides an improved network and methods of operation thereof for use in or with process control systems, computer-based manufacturing or production control systems, environmental control systems, industrial control system, and the like (collectively, “control systems”). Those networks ...


9
Chih Chao Yang, Shom Ponoth, David Rath, Keith Kwong Hon Wong: Conductor-dielectric structure and method for fabricating. International Business Machines Corporation, Connolly Bove Lodge & Hutz, November 20, 2008: US20080284019-A1

A conductor-dielectric interconnect structure is fabricated by providing a structure comprising a dielectric layer having a patterned feature therein; depositing a plating seed layer on the dielectric layer in the patterned feature; depositing a sacrificial seed layer on the plating seed layer in th ...


10
Bharat Khuti, Clayton Coleman, David Rath, Ernest Rakaczky, Jim Leslie, Juan Peralta, George Simpson: Process control methods and apparatus for intrusion detection, protection and network hardening. Invensys Systems, Nutter Mcclennen & Fish, March 9, 2006: US20060053491-A1

The invention provides an improved network and methods of operation thereof for use in or with process control systems, computer-based manufacturing or production control systems, environmental control systems, industrial control system, and the like (collectively, “control systems”). Those networks ...