1
Barclay J Tullis, Mihir Parikh, David L Thrasher, Mark E Johnston: Particle-free dockable interface for integrated circuit processing. Hewlett Packard Company, Jeffery B Fromm, August 6, 1985: US04532970 (89 worldwide citation)

A particle-free dockable interface is disclosed for linking together two spaces each enclosing a clean air environment. The interface is composed of interlocking doors on each space which fit together to trap particles which have accumulated from the dirty ambient environment on the outer surfaces o ...


2
David L Thrasher, Lynn Ryle: Automatically adjustable brush assembly for cleaning semiconductor wafers. OnTrak Systems, Flehr Hohbach Test Albright & Herbert, December 19, 1995: US05475889 (55 worldwide citation)

An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the arms of the ...


3
Barclay J Tullis, Mihir Parikh, David L Thrasher, Mark E Johnston: Particle-free dockable interface for integrated circuit processing. Hewlett Packard Company, Jeffery B Fromm, October 14, 1986: US04616683 (41 worldwide citation)

A particle-free dockable interface is disclosed for linking together two spaces each enclosing a clean air environment. The interface is composed of interlocking doors on each space which fit together to trap particles which have accumulated from the dirty ambient environment on the outer surfaces o ...


4
Wilbur C Krusell, David L Thrasher, Lynn S Ryle: Megasonic bath. Ontrak Systems, Blakely Sokoloff Taylor & Zafman, June 9, 1998: US05762084 (21 worldwide citation)

A megasonic bath with horizontal wafer orientation that may be conveniently interfaced with brush scrub systems. The megasonic transducer creates a sonic energy flow in the direction of the wafers. The sonic energy causes cavitation which loosens and displaces particles from the surface of the wafer ...


5
David L Thrasher, Lynn S Ryle, Robert M Ruppell, John S Hearne, Wilbur C Krussell, Gary D Youre: Substrate processing system. OnTrak Systems, Blakely Sokoloff Taylor & Zafman, May 5, 1998: US05745946 (21 worldwide citation)

An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels ar ...


6
Mark A Simmons, Martin J McGrath, David L Thrasher: Scrubber control system. OnTrak Systems, Blakely Sokoloff Taylor & Zafman, November 2, 1999: US05975736 (20 worldwide citation)

A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the host processor ...


7
David L Thrasher, John S Hearne, Lynn S Ryle: Contamination control in substrate processing system. Ontrak Systems, Blakely Sokoloff Taylor & Zafman, March 17, 1998: US05727332 (16 worldwide citation)

An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels ar ...


8
Lynn S Ryle, Robert M Ruppell, David L Thrasher, Martin J McGrath: Method and apparatus for detecting a substrate in a substrate processing system. OnTrak Systems, Blakely Sokoloff Taylor & Zafman, February 25, 1997: US05606251 (14 worldwide citation)

An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels ar ...


9
Mark A Simmons, Martin J McGrath, David L Thrasher: Scrubber control system. OkTrak Systems, Blakey Sokoloff Taylor & Zafman, August 20, 1996: US05548505 (6 worldwide citation)

A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the host processor ...


10
Albert M Saenz, David L Thrasher, Wilbur C Krusell, William G Drapak: Hesitation free roller. OnTrak Systems, Blakely Sokoloff Taylor & Zafman, December 21, 1999: US06003185 (4 worldwide citation)

A method and apparatus for rotating wafers in a scrubber, wherein both sides of a wafer are scrubbed without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a cleaning process wherein both sides of a wafer are scrubbed. The rotating roller and wafer co ...