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Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 8, 2013: US08351018 (10 worldwide citation)

A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.


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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2013: US08345218 (8 worldwide citation)

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


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Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 16, 2013: US08421993 (5 worldwide citation)

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the to ...


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Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert Jan Gerardus Johannes Thomas Brands, Koen Steffens: Lithographic apparatus having parts with a coated film adhered thereto. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 14, 2009: US07561250 (4 worldwide citation)

A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a subst ...


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Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 26, 2013: US08405815

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from ...


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Daniel Jozef Maria Direcks, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona: Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, April 11, 2017: US09618835

In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.


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Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Marcus Johannes Van Der Zanden, Pieter Mulder: Fluid handling structure, lithographic apparatus and a device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 28, 2014: US08638417

A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing sur ...