1
Christopher P Ausschnitt, Timothy A Brunner: Optical metrology tool and method of using same. International Business Machines Corporation, Geza C Ziegler Jr, Tiffany L Townsend, DeLio & Peterson, October 10, 2000: US06130750 (134 worldwide citation)

A metrology apparatus for determining bias or overlay error in a substrate formed by a lithographic process includes an aperture between the objective lens and the image plane adapted to set the effective numerical aperture of the apparatus. The aperture is adjustable to vary the effective numerical ...


2
Christopher P Ausschnitt, William A Muth: Method of measuring bias and edge overlay error for sub-0.5 micron ground rules. International Business Machines Corporation, Peter W DeLio & Peterson Peterson, Aziz M Ahsan, May 26, 1998: US05757507 (129 worldwide citation)

A method of determining bias or overlay error in a substrate formed by a lithographic process uses a pair of straight vernier arrays of parallel elements, a staggered vernier array of parallel elements, and optionally at least one image shortening array on the substrate. The ends of the elements for ...


3
Christopher P Ausschnitt, Timothy J Wiltshire: Method for overlay control system. International Business Machines Corporation, Tiffany L Townsend, Ratner & Prestia, March 2, 1999: US05877861 (129 worldwide citation)

A method for overlay metrology and control. Simultaneous use of between-field overlay metrology to control field term alignment error at all levels and level-to-level metrology to control field term, grid term, and translation alignment errors at all levels is applied.


4
Christopher P Ausschnitt, William A Muth: Edge overlay measurement target for sub-0.5 micron ground rules. International Business Machines Corporation, Peter W Peterson, Alison D Mortinger, DeLio & Peterson, January 27, 1998: US05712707 (102 worldwide citation)

A target for determining bias or overlay error in a substrate formed by a lithographic process uses a pair of straight vernier arrays of parallel elements, a staggered vernier array of parallel elements, and optionally at least one image shortening array on the substrate. The ends of the elements fo ...


5
Christopher P Ausschnitt, Diana Nyyssonen deceased, by Jeffrey Swing executor: Combined segmented and nonsegmented bar-in-bar targets. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, October 3, 2000: US06128089 (94 worldwide citation)

A target for measurement of critical dimension bias on a substrate formed by a lithographic process comprises six contrasting arrays of elements on first and second layers of the substrate. Each of the arrays has a plurality of spaced parallel elements contrasting with the substrate. Ends of the con ...


6
Christopher P Ausschnitt: Overlay test wafer. The Perkin Elmer Corporation, Thomas P Murphy, E T Grimes, F L Masselle, August 27, 1985: US04538105 (67 worldwide citation)

The present invention is directed to an improved test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits, which includes four conductors with circuitry provided for each conductor measuring the ...


7
Christopher P Ausschnitt: Monitoring of minimum features on a substrate. International Business Machines Corporation, Kris V Srikrishnan, May 13, 1997: US05629772 (60 worldwide citation)

A method of measuring bias of a minimum feature in a lithographic process uses creating an array of elements having a width and space corresponding to the minimum feature, and a length. The length change of the array element resulting from image shortening effect from a lithographic process is measu ...


8
Christopher P Ausschnitt: Segmented bar-in-bar target. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, October 24, 2000: US06137578 (56 worldwide citation)

A target for measurement of critical dimension bias on a substrate formed by a lithographic process comprises three sets of contrasting arrays of elements on the substrate. Each of the arrays has a plurality of spaced parallel elements contrasting with the substrate. Ends of the contrasting elements ...


9
Christopher P Ausschnitt, Timothy A Brunner: Optical metrology tool and method of using same. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, November 13, 2001: US06317211 (54 worldwide citation)

A metrology apparatus for determining bias and overlay errors in a substrate formed by a lithographic process includes an aperture between the objective lens and the image plane adapted to set the effective numerical aperture of the apparatus. The aperture is adjustable to vary the effective numeric ...


10
Christopher P Ausschnitt, David A Huchital: Coating apparatus. The Perkin Elmer Corporation, Giarratana, E T Grimes, T P Murphy, September 22, 1981: US04290384 (54 worldwide citation)

An apparatus and method for coating a substrate with a thin film of material. The coating material is converted to a mist by means of an ultrasonic nebulizer and transported by a carrier gas to a chamber which contains the substrate where the mist is allowed to settle onto the substrate under the fo ...



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