1
Christophe Pierrat, Alfred K Wong: Design-manufacturing interface via a unified model. Magma Design Automation, Fenwick & West, December 26, 2006: US07155689 (258 worldwide citation)

Subtleties of advanced fabrication processes and nano-scale phenomena associated with integrated circuit miniaturization have exposed the insufficiencies of design rules. Such inadequacies have adverse impact on all parts of the integrated circuit creation flow where design rules are used. In additi ...


2
Christophe Pierrat, James Burdorf: Inspection technique of photomask. Micron Technology, Schwegman Lundberg Woessner & Kluth P A, July 18, 2000: US06091845 (228 worldwide citation)

An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generat ...


3
Michel Luc Côté, Philippe Hurat, Christophe Pierrat: Method and apparatus for facilitating process-compliant layout optimization. Numerical Technologies, Park Vaughan & Fleming, June 1, 2004: US06745372 (201 worldwide citation)

One embodiment of the invention provides a system that simulates effects of a manufacturing process on an integrated circuit to enhance process latitude and/or reduce layout size. During operation, the system receives a representation of a target layout for the integrated circuit, wherein the repres ...


4
Michel L Côté, Christophe Pierrat: Standard cell design incorporating phase information. Synopsys, Bever Hoffman & Harms, Jeannette S Harms, April 11, 2006: US07028285 (197 worldwide citation)

Phase information is incorporated into a cell-based design methodology. Standard cells have four edges: top, bottom, left, and right. The top and bottom edges have fixed phase shifters placed, e.g. 0. A given cell C will have a phase set created with two versions: 0-180 (left-right) as well as 180-0 ...


5
Christophe Pierrat: High yield reticle with proximity effect halos. Synopsys, Bever Hoffman & Harms, Jeanette S Harms, November 22, 2005: US06968527 (196 worldwide citation)

A lithography reticle advantageously includes “proximity effect halos” around tight tolerance features. During reticle formation, the tight tolerance features and associated halos can be carefully written and inspected to ensure accuracy while the other portions of the reticle can be written/inspect ...


6
Christophe Pierrat: Phase shift masking for complex patterns with proximity adjustments. Synopsys, Mark A Haynes, Haynes Beffel & Wolfeld, November 7, 2006: US07132203 (195 worldwide citation)

Techniques are provided for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features. The method includes identifying features for which phase shifting can be applied, automatical ...


7
Michel Luc Côté, Christophe Pierrat, Philippe Hurat: Accelerated layout processing using OPC pre-processing. Numerical Technologies, Jeanette S Harms, Bever Hoffman & Harms, October 19, 2004: US06807663 (193 worldwide citation)

Performing optical proximity correction (OPC) is typically done during a critical time, wherein even small delays in finishing OPC can have significant adverse effects on product introduction and/or market exposure. In accordance with one feature of the invention, sets of repeating structures in lib ...


8
Christophe Pierrat, Youping Zhang: Dissection of printed edges from a fabrication layout for correcting proximity effects. Synopsys, Beyer Hoffman & Harms, Jeanette S Harms, July 12, 2005: US06918104 (189 worldwide citation)

Techniques for fabricating a device include forming a fabrication layout, such as a mask layout, for a physical design layer, such as a design for an integrated circuit, and identifying evaluation points on an edge of a polygon corresponding to the design layer for correcting proximity effects. Tech ...


9
Christophe Pierrat, Youping Zhang: Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout. Numerical Technologies, Jeanette S Harms, Bever Hoffman & Harms, August 17, 2004: US06777138 (188 worldwide citation)

Techniques provided for fabricating a device include forming a fabrication layout, such as a mask layout, for a physical design layer, such as a design for an integrated circuit, and identifying evaluation points on an edge of a polygon corresponding to the design layer for correcting proximity effe ...


10
Michel L Côté, Christophe Pierrat: Design data format and hierarchy management for phase processing. Synopsys, Bever Hoffman & Harms, Jeanette S Harms, December 20, 2005: US06978436 (187 worldwide citation)

Definition of a phase shifting layout from an original layout can be time consuming. If the original layout is divided into useful groups, i.e. clusters that can be independently processed, then the phase shifting process can be performed more rapidly. If the shapes on the layout are enlarged, then ...