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Christof Tilmann Bodendorf, Jörg Thiele: Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor. Infineon Technologies, Laurence A Greenberg, Werner H Stemer, Gregory L Mayback, June 1, 2004: US06745380 (162 worldwide citation)

A method of producing a layout for a mask for use in semiconductor production includes a two-stage, iterative optimization of the position of scatter bars in relation to main structures being carried out. In a first stage, following first production of scatter bars and carrying out an OPC, scatter b ...


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Christof Tilmann Bodendorf, Jorg Thiele: Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor. Lerner And Greenberg Pa, March 6, 2003: US20030046654-A1

A method of producing a layout for a mask for use in semiconductor production includes a two-stage, iterative optimization of the position of scatter bars in relation to main structures being carried out. In a first stage, following first production of scatter bars and carrying out an OPC, scatter b ...