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Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden: Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASM Lithography, Pillsbury Winthrop, May 13, 2003: US06563564 (25 worldwide citation)

The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic ...


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Christianus Gerardus Maria De Mol: Method of characterization, method of characterizing a process operation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 19, 2010: US07649614 (4 worldwide citation)

A system in which deformation of a substrate is monitored during processing of the substrate is described. In one embodiment, the distortion in the substrate is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database. ...


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Maria Elisabeth Reuhman Huisken, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma: Method of characterization, method of characterizing a process operation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07410735 (4 worldwide citation)

A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a da ...


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Everhardus Cornelis Mos, Mircea Dusa, Jozef Maria Finders, Christianus Gerardus Maria De Mol, Scott Anderson Middlebrooks, Dongzi Wangli: Optimization method and a lithographic cell. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 17, 2013: US08612045 (3 worldwide citation)

Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.


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Christianus Gerardus Maria De Mol, Maria Elisabeth Reuhman Huisken: Methods of characterizing similarity or consistency in a set of entities. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 29, 2011: US07916275 (1 worldwide citation)

A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation ...


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Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Li Chung Hsun: Methods and apparatus for measuring a property of a substrate. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 14, 2017: US09594029

In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced (2506) defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermi ...


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Michael Van Der Veen, Anastasius Jacobus Anicetus Bruinsma, Henricus Wilhelmus Maria Van Buel, Jacob Fredrik Friso Klinkhamer, Martinus Hendrikus Antonius Leenders, Christianus Gerardus Maria De Mol, Hubert Adriaan Van Mierlo: Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 20, 2009: US07480028

The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidenti ...