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Christian Alexander Hoogendam, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 19, 2006: US07110081 (92 worldwide citation)

In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectivel ...


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Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christian Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen: Lithographic apparatus and device manufacturing method. Asml Netherlands, January 19, 2012: US20120013867-A1

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the ...