1
Chia Tai Chang, Chin Yi Tsai, Chiu Kuei Chen, Chen Chih Yu, Chien Chang Lai, Chin Tien Yang, Hui Pin Yang, Keng Shieng Chang, Yun Ru Huang: High frequency probe card. MPI CORPORATION, Muncy Geissler Olds & Lowe P C, December 1, 2015: US09201098 (1 worldwide citation)

A high frequency probe card includes at least one substrate having at least one first opening, an interposing plate disposed on the at least one substrate and having at least one second opening corresponding to the at least one first opening, a circuit board disposed on the interposing plate and hav ...


2
Chia Tai Chang, Chin Yi Tsai, Chiu Kuei Chen, Chen Chih Yu, Chien Chang Lai, Chin Tien Yang, Hui Pin Yang, Keng Shieng Chang, Yun Ru Huang: Probe holding structure and optical inspection device equipped with the same. MPI Corporation, Muncy Geissler Olds & Lowe P C, January 26, 2016: US09244018

A probe holding structure includes a substrate and a plurality of holding modules. The substrate has an opening and a plurality of grooves arranged around a periphery of the opening. The holding modules are connected with the grooves, respectively. Each holding modules includes a fixing member and a ...


3
Tien Chen Hu, Chih Ming Hsieh, Chien Chang Lai, Wen Jin Lee, Da Hsiang Chen: System for cleaning a wafer. Taiwan Semiconductor Manufacturing, Birch Stewart Kolasch & Birch, November 2, 2010: US07823241

A system for cleaning a wafer. At least one first chuck roller is connected to a first roller base and includes a first annular groove. A second roller base opposes the first roller base. At least one second chuck roller is connected to the second roller base and includes a second annular groove. A ...


4
Hsien Li Chiu, Chien Chang Lai, Kuo Hua Wu: Device and method for sealing an ink cartridge. Birch Stewart Kolasch & Birch, May 29, 2003: US20030097826-A1

The present invention provides a sealing device and method for an ink cartridge. First, the ink cartridge and a sealing film are placed in an airtight chamber isolated to the atmosphere. Second, a decompression mechanism is used to draw the air off the airtight chamber until the air pressure in the ...


5
Tien Chen Hu, Chih Ming Hsieh, Chien Chang Lai, Wen Jin Lee, Da Hsiang Chen: System for cleaning a wafer. Taiwan Semiconductor Manufacturing, Birch Stewart Kolasch & Birch, September 25, 2008: US20080229526-A1

A system for cleaning a wafer. At least one first chuck roller is connected to a first roller base and includes a first annular groove. A second roller base opposes the first roller base. At least one second chuck roller is connected to the second roller base and includes a second annular groove. A ...