1
Hiroshi Ito, Carlton G Willson, Jean M J Frechet: Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone. International Business Machines Corporation, Joseph G Walsh, January 1, 1985: US04491628 (561 worldwide citation)

Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in po ...


2
Hiroshi Ito, Scott A MacDonald, Robert D Miller, Carlton G Willson: Radiation sensitive and oxygen plasma developable resist. International Business Machines Corporation, Joseph G Walsh, November 12, 1985: US04552833 (92 worldwide citation)

A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; ...


3
Jean M J Frechet, Hiroshi Ito, Scott A MacDonald, Carlton G Willson: Positive tone oxygen plasma developable photoresist. International Business Machines Corporation, Joseph G Walsh, April 14, 1987: US04657845 (75 worldwide citation)

A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, t ...


4
George J Hefferon, Hiroshi Ito, Scott A MacDonald, Carlton G Willson: Method of creating patterned multilayer films for use in production of semiconductor circuits and systems. International Business Machines Corporation, John A Stemwedel, March 13, 1990: US04908298 (63 worldwide citation)

A method is provided for creating multilayer patterned films wherein at least one layer is an etch-resistant patterned layer, and wherein either positive or negative tone patterns can be obtained.


5
William R Brunsvold, Ming Fea Chow, Willard E Conley, Dale M Crockatt, Jean M J Frechet, George J Hefferon, Hiroshi Ito, Nancy E Iwamoto, Carlton G Willson: Thermally stable photoresists with high sensitivity. John A Stemwedel, July 3, 1990: US04939070 (55 worldwide citation)

The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permi ...


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Todd C Bailey, Byung Jin Choi, Matthew E Colburn, Sidlgata V Sreenivasan, Carlton G Willson, John G Ekerdt: Imprint lithography template having a feature size under 250 nm. Board of Regents The University of Texas System, Fish & Richardson P C, June 12, 2007: US07229273 (36 worldwide citation)

The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.


8
Nicholas J Clecak, Dennis R McKean, Robert D Miller, Terry C Tompkins, Robert J Twieg, Carlton G Willson: Positive resist compositions. International Business Machines Corporation, Joseph G Walsh, August 9, 1983: US04397937 (36 worldwide citation)

Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.


9
Kantilal Jain, Carlton G Willson: High resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shifting. International Business Machines Corporation, Otto Schmid Jr, July 10, 1984: US04458994 (31 worldwide citation)

An optical lithography method and apparatus in which a pulsed excimer laser produces at least one fundamental output which is directed to expose a photosensitive medium. The output is highly non-gaussian and has sufficient power so that full exposures can be accomplished within a few seconds. An alt ...


10
James F Cameron, Jean M J Frechet, Man Kit Leung, Claus Peter Niesert, Scott A MacDonald, Carlton G Willson: Photoresist composition with photosensitive base generator. International Business Machines Corporation, Robert B Martin, August 13, 1996: US05545509 (28 worldwide citation)

The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.