1
Robert F Foster, Helen E Rebenne, Rene E LeBlanc, Carl L White, Rikhit Arora: Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means. Materials Research Corporation, Donald F Frei, Joseph R Jordan, December 28, 1993: US05273588 (103 worldwide citation)

A semiconductor wafer processing apparatus, particularly a CVD reactor, is provided with plasma cleaning electrodes integrated into process gas flow shaping structure that smoothly directs the gas past the wafer on a susceptor. The processing apparatus preferably has a showerhead or other inlet to d ...


2
Robert F Foster, Helen E Rebenne, Rene E LeBlanc, Carl L White, Rikhit Arora: Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD. Materials Research Corporation, Wood Herron & Evans, December 6, 1994: US05370739 (93 worldwide citation)

A semiconductor wafer processing apparatus or module for a cluster tool is provided with a single wafer rotating susceptor that thins the gas boundary layer to facilitate the transfer of material to or from the wafer, in, for example, CVD for blanket or selective deposition of tungsten or titanium n ...


3
Kyle Fondurulia, Eric Shero, Mohith E Verghese, Carl L White: Precursor delivery system. ASM America, Knobbe Martens Olson & Bear, March 20, 2012: US08137462 (74 worldwide citation)

A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passag ...


4
Carl L White, Eric Shero, Joe Reed: Gap maintenance for opening to process chamber. ASM America, Knobbe Martens Olson & Bear, July 10, 2012: US08216380 (69 worldwide citation)

A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to ...


5
Robert F Foster, Helen E Rebenne, Rene E LeBlanc, Carl L White, Rikhit Arora: Semiconductor wafer processing method and apparatus with heat and gas flow control. Materials Research Corporation, Wood Herron & Evans, October 18, 1994: US05356476 (67 worldwide citation)

A semiconductor wafer processing apparatus is provided with a susceptor for supporting a wafer for CVD of films such as blanket or selective deposition of tungsten or titanium nitride, and degassing and annealing processes. Preferably, a downwardly facing showerhead directs a gas mixture from a cool ...


6
Kyle Fondurulia, Eric Shero, Mohith E Verghese, Carl L White: Precursor delivery system. ASM America, Snell & Wilmer, March 24, 2015: US08986456 (62 worldwide citation)

A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed ...


7
Eric Shero, Mohith E Verghese, Carl L White, Herbert Terhorst, Dan Maurice: Semiconductor processing reactor and components thereof. ASM America, Snell & Wilmer, July 19, 2016: US09394608 (25 worldwide citation)

A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mix ...


8
Carl L White: Polymer coating for vapor deposition tool. ASM America, Knobbe Martens Olson & Bear, September 29, 2009: US07595271 (10 worldwide citation)

Described herein is an apparatus useful for depositing a material on a substrate. At least one component of the apparatus comprises a protective coating, which facilitates the cleaning and/or removal of the deposited material from the component. Also described are methods for depositing a material o ...


9
Jason D Licamele, Carl L White: V-Trough photobioreactor systems. Heliae Development, Tom Gallegos Esq, Justin Kniep Esq, Wilmer Cutler Pickering Hale and Dorr, February 5, 2013: US08365462 (7 worldwide citation)

Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nit ...


10
Jason D Licamele, Carl L White: Operation and control of V-trough photobioreactor systems. Heliae Development, Tom Gallegos Esq, Justin Kniep Esq, Colleen Superko Esq, January 1, 2013: US08341877 (5 worldwide citation)

Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nit ...