1
David Sherrer
Matthew L Moynihan, Bruno M Sicard, Carl J Colangelo, John P Cahalen, Brian D Amos, Kevin S Horgan, John J Fisher, David W Sherrer: Optical interface assembly and method of formation. Rohm and Haas Electronics Materials, Jonathan D Baskin, November 6, 2007: US07292756 (12 worldwide citation)

Optical interface assemblies are provided. The optical interface assemblies include a first portion having a plurality of optical waveguides. The first portion is configured for mating engagement with an optical fiber connector. A second portion is mated to the first portion. The second portion is c ...


2
David Sherrer
Matthew L Moynihan, Bruno M Sicard, Carl J Colangelo, John P Cahalen, Brian D Amos, Kevin S Horgan, John J Fisher, David W Sherrer: Optical interface assembly and method of formation. Edwards & Angell, July 28, 2005: US20050163431-A1

Optical interface assemblies are provided. The optical interface assemblies include a first portion having a plurality of optical waveguides. The first portion is configured for mating engagement with an optical fiber connector. A second portion is mated to the first portion. The second portion is c ...


3
Krishna Balantrapu, Brian D Amos, Stephen McCammon: Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films. Rohm and Haas Electronic Materials, John J Piskorski, April 11, 2017: US09622353

Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline strippable UV blocking composition is selectively applied to ...


4
Krishna Balantrapu, Brian D Amos, Stephen McCammon: Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films. Rohm and Haas Electronic Materials, John J Piskorski, May 23, 2017: US09661754

Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline soluble UV blocking composition is selectively applied to the ...


5
Paul J Ciccolo, Brian D Amos, Stephen McCammon: Method of removing negative acting photoresists. Rohm and Haas Electronic Materials, John J Piskorski, March 10, 2015: US08975008

Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.



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