1
Mang Mang Ling, Sean S Kang, Jeremiah T P Pender, Srinivas D Nemani, Bradley Howard: Methods for etching an etching stop layer utilizing a cyclical etching process. Applied Materials, Patterson & Sheridan, March 17, 2015: US08980758 (84 worldwide citation)

Methods for etching an etching stop layer disposed on the substrate using a cyclical etching process are provided. In one embodiment, a method for etching an etching stop layer includes performing a treatment process on the substrate having a silicon nitride layer disposed thereon by supplying a tre ...


2
Andrew Nguyen, Kartik Ramaswamy, Srinivas Nemani, Bradley Howard, Yogananda Sarode Vishwanath: Semiconductor system assemblies and methods of operation. Applied Materials, Kilpatrick Townsend & Stockton, March 15, 2016: US09287095 (54 worldwide citation)

An exemplary semiconductor processing system may include a remote plasma source coupled with a processing chamber having a top plate. An inlet assembly may be used to couple the remote plasma source with the top plate and may include a mounting assembly, which in embodiments may include at least two ...


3
Shing Yeh, Bradley Howard Carter: Composite solder paste for flip chip bumping. Delco Electronics Corporation, Jimmy L Funke, September 8, 1998: US05803340 (54 worldwide citation)

Composite solder paste compositions adapted to be deposited using a dry film photoresist mask to form solder joints for flip chip integrated circuit devices. The composite solder paste compositions are characterized by the ability to flow at a first temperature during bumping reflow while the photor ...


4
Mang Mang Ling, Jungmin Ko, Sean S Kang, Jeremiah T Pender, Srinivas D Nemani, Bradley Howard: Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process. Applied Materials, Patterson & Sheridan, January 10, 2017: US09543163 (19 worldwide citation)

Methods for etching a material layer disposed on the substrate using a combination of a main etching step and a cyclical etching process are provided. The method includes performing a main etching process in a processing chamber to an oxide layer, forming a feature with a first predetermined depth i ...


5
Shelby Marcus David, Donelson Michael Eugene, Dayvolt Bradley Howard, Wilson Alan Kent, Kirkman Bryan: Mixed cellulose esters having low bifringence and films made therefrom. Eastman Chemical Company, BOSHEARS Betty J, March 5, 2009: WO/2009/029220 (18 worldwide citation)

The present invention relates to cellulose esters having low hydroxyl content for use in optical applications, such as liquid crystal display (LCD) films. Films made with low hydroxyl levels and a given ratio of non-acetyl ester to hydroxyl level have been found to have low intrinsic birefringence. ...


6
Shelby Marcus David, Donelson Michael Eugene, Dayvolt Bradley Howard, Wilson Alan Kent, Kirkman Bryan: Mixed cellulose ester compositions comprising a plasticizer and having low bifringence and films made therefrom for liquid crystal displays. Eastman Chemical Company, BOSHEARS Betty J, March 5, 2009: WO/2009/029217 (9 worldwide citation)

The present invention relates to cellulose esters having low hydroxyl content for use in optical applications, such as liquid crystal display (LCD) films. Films made with low hydroxyl levels and a given ratio of non-acetyl ester to hydroxyl level have been found to have low intrinsic birefringence. ...


7
Bradley Howard B: Manufacture of silicon metal from a mixture of chlorosilanes. Union Carbide Corporation, Skoler G A, August 19, 1975: US3900660 (6 worldwide citation)

A high yield process for making polycrystalline silicon metal suitable for semiconductor usage which involves vapor phase decomposition of a mixture of dichlorosilane and trichlorosilane.


8
Shing Yeh, Curtis Wayne Melcher, Bradley Howard Carter: Fatigue-resistant lead-free alloy. Delco Electronics Corporation, Jimmy L Funke, August 17, 1999: US05938862 (5 worldwide citation)

A lead-free solder alloy suitable for forming solder joints of a surface-mount integrated circuit device, such as a flip chip. The solder alloy has a sufficiently low liquidus temperature to achieve desirable reflow properties at temperatures of 240.degree. C. and less, and is therefore compatible w ...


9
Marcus David Shelby, Michael Eugene Donelson, Bradley Howard Dayvolt, Alan Kent Wilson, Bryan Kirkman: Cellulose ester compositions having low birefringence and films made therefrom. Eastman Chemical Company, Betty J Boshears, Louis N Moreno, December 11, 2012: US08329893 (3 worldwide citation)

The present invention relates to cellulose esters having low hydroxyl content for use in optical applications, such as liquid crystal display (LCD) films. Films made with low hydroxyl levels and a given ratio of non-acetyl ester to hydroxyl level have been found to have low intrinsic birefringence. ...


10
Marcus David Shelby, Michael Eugene Donelson, Bradley Howard Dayvolt, Alan Kent Wilson, Bryan Kirkman: Cellulose ester compositions having low birefringence and films made therefrom comprising a plasticizer. Eastman Chemical Company, Betty J Boshears, Louis N Moreno, January 1, 2013: US08344134 (2 worldwide citation)

The present invention relates to cellulose esters having low hydroxyl content for use in optical applications, such as liquid crystal display (LCD) films. Films made with low hydroxyl levels and a given ratio of non-acetyl ester to hydroxyl level have been found to have low intrinsic birefringence. ...