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Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


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Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 4, 2006: US07023525 (5 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


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Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf: Sensor for use in a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 18, 2008: US07453078 (3 worldwide citation)

A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical el ...


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Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf: Sensor for use in a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 16, 2007: US07282701 (3 worldwide citation)

A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical el ...


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Borgert Kruizinga, Martijn Gerard Dominique Wehrens, Michiel David Nijkerk, Kornelis Frits Feenstra: Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 15, 2013: US08559108 (1 worldwide citation)

A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radi ...


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Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. Asml Netherlands, Pillsbury Winthrop, February 13, 2003: US20030030781-A1 (1 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


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Marcus Adrianus Van De Kerkhof, Haico Victor Kok, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Werner Weissbrodt, Manfred Helmut Gustav Wilhelm Johannes Schrenk, Torsten Harzendorf: Lithographic apparatus and sensor therefor. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 14, 2014: US08629418

A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medi ...


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Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko: Lithographic method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, November 21, 2017: US09823572

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the powe ...


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Jacobus Hubertus Theodoor Jamar, Andries Rijfers, Borgert Kruizinga, Jentske D Kooistra, Mark Herman Else Vaes: Illumination system for use in a stereolithography apparatus. Nederlandse Organisatie voor toegepast natuurwetenschappelijk Onderzoek TNO, DSM IP Assets, Swanson & Bratschun L L C, September 16, 2014: US08836916

The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for app ...