1
Gerd Hewig, Berthold Schum, Jorg Worner: Method for executing a reproducible glow discharge. Cushman Darby & Cushman, March 14, 1989: US04812416 (13 worldwide citation)

In order to be able to check whether or not a glow procedure is executed properly, i.e. reproducibly, the temporal course of the formation of characteristic stable reaction products is traced mass spectrometrically.


2
Rudolf Hezel, Winfried Hoffmann, Berthold Schum: Method for re-using silicon base material of a metal insulator semiconductor (mis) inversion-layer solar cell. Nukem, Beveridge DeGrandi & Weilacher, January 2, 1990: US04891325 (12 worldwide citation)

A method is proposed for re-using silicon base material of defective MIS inversion-layer solar cells, where at least MIS solar cell-specific layers are stripped off and replaced by corresponding new layers.


3
Hilmar von Campe, Dietmar Liedtke, Berthold Schum, WoJorg: Method and device for forming a layer by plasma-chemical process. Nukem, Cushman Darby & Cushman, April 10, 1990: US04915978 (7 worldwide citation)

A method and a device are proposed for formation of a layer on a surface of a substrate by plasma-chemical process, where the surface is aligned parallel to the electrical field required for the plasma-chemical process. In addition, the gas required therefor flows directly onto the surface.


4
Sylke Klein, Armin Kübelbeck, Werner Stockum, Wilfried Schmidt, Berthold Schum: Combined etching and doping substances. Merck Patentgesellschaft, Millen White Zelano Branigan P C, December 8, 2009: US07629257 (5 worldwide citation)

The invention concerns etching and doping substances free of hydrochloric/fluoride acid used for etching inorganic layers as well as for doping subjacent layers. The invention also concerns a method wherein said substances are used.


5
Sylke Klein, Armin Kübelbeck, Werner Stockum, Wilfried Schmidt, Berthold Schum: Combined etching and doping media. Merck Patent, Millen White Zelano Branigan P C, April 3, 2012: US08148191 (1 worldwide citation)

The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.


6
Gernot Wandel, Fritz Heyer, Berthold Schum: Process and device for treatment of sheet objects in a liquid bath. Angewandte Solarenergie ASE, Dennison Scheiner Schultz & Wakeman, October 23, 2001: US06306224 (1 worldwide citation)

A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronously with the disk, and by a retaining element mounted adjacent th ...


7
Agata Lachowicz, Berthold Schum, Knut Vaas: Method for the wet-chemical etching back of a solar cell emitter. CSEM CENTRE SUISSE D ELECTRONIQUE ET DE MICROTECHNIQUE —RECHERCHE ET DEVÉLOPPEMENT, Ohlandt Greeley Ruggiero & Perle L, February 28, 2017: US09583652

A method for the wet-chemical etching of a highly doped silicon layer in an etching solution is provided. The method includes using, as an etching solution so as to perform etching homogeneously, an HF-containing etching solution containing at least one oxidizing agent selected from the group of per ...


8
Agata Lachowicz, Berthold Schum, Heinrich Blanke: Alkaline pickling process. Fraunhofer Gesellschaft zur Förderung der Angewandten Forschung E V, Hudak Shunk & Farine Co LPA, January 31, 2017: US09558952

A process for edge isolation or texture smoothing of a substrate, in which a process medium which allows control treatment of limited regions of the substrate is used. The process is therefore particularly suitable for one-sided treatment of substrates. The viscosity of the process medium plays a ce ...


9
Andreas Teppe, Berthold Schum, Dieter Franke, Ingo Schwirtlich, Knut Vaas, Wilfried Schmidt: Method for chemically treating a substrate. Schott Solar, Ladas & Parry, October 22, 2013: US08563440

A method for chemically treating a disc-shaped substrate having a bottom surface, a top surface and side surfaces by contacting a process medium that is fluid-chemically active with at least the bottom surface of the substrate. The substrate is moved relative to the process medium while forming a tr ...


10
Sylke Klein, Armin Kubelbeck, Werner Stockum, Wilfried Schmidt, Berthold Schum: Combined etching and doping substances. Millen White Zelano & Branigan PC, December 2, 2004: US20040242019-A1

The invention concerns etching and doping substances free of hydrochloric/fluoride acid used for etching inorganic layers as well as for doping subjacent layers. The invention also concerns a method wherein said substances are used.