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Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Fransiscus Van Der Pasch, Ronald Van Der Ham, Niek Jacobus Johannes Roset: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 7, 2007: US07253875 (92 worldwide citation)

A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one o ...


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Bernardus Antonius Johannes Luttikhuis, Henrikus Herman Marie Cox, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot: Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, January 27, 2009: US07483120 (76 worldwide citation)

A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associ ...


3
Wilhelmus Josephus Box, Bernardus Antonius Johannes Luttikhuis, Thomas Henricus Jacobus Verhagen: Lithographic apparatus, thermal conditioning system, and method for manufacturing a device. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 9, 2009: US07545478 (6 worldwide citation)

A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation ...


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Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Bernardus Antonius Johannes Luttikhuis: Lithographic apparatus and device manufacturing method utilizing a substrate handler. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, May 26, 2009: US07538857 (4 worldwide citation)

A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto ...


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Bernardus Antonius Johannes Luttikhuis, Pertrus Rutgerus Bartray, Wilhelmus Josephus Box, Martinus Hendrikus Antonius Leenders, Marc Wilhelmus Maria Van Der Wijst: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 20, 2005: US06977713 (4 worldwide citation)

A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system t ...


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Bernardus Antonius Johannes Luttikhuis, Petrus Rutgerus Bartray, Johannes Henricus Wilhelmus Jacobs, Thijs Harink, Paulus Martinus Maria Liebregts: Lithographic apparatus and a device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 24, 2006: US07126664 (3 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project t ...


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Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han Kwang Nienhuys, Maikel Bernardus Theodorus Leenders: Lithographic apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 6, 2016: US09513566 (2 worldwide citation)

A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs o ...


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Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Dominicus Jacobus Petrus Adrianus Franken, Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Franciscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Marc Johannes Martinus Engels: Lithographic apparatus with patterning device position determination. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 30, 2008: US07471373 (2 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a ...


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Bernardus Antonius Johannes Luttikhuis, Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Marco Koert Stavenga, Thijs Harink: Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 21, 2009: US07522258 (1 worldwide citation)

A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a ...