1
Benjamin Y H Liu, Kang H Ahn: System for surface and fluid cleaning. Regents of the University of Minnesota, Merchant Gould Smith Edell Welter & Schmidt, April 4, 1989: US04817652 (71 worldwide citation)

A cleaning system of the apparatus utilizing the effect of surface tension forces (4) and phase changes between a liquid and gas. In one embodiment the surface (21) to be cleaned is submerged within a vessel (30), the pressure within the vessel being increased. A rapid depressurization of the vessel ...


2
Virgil A Marple, Benjamin Y H Liu: High volume virtual impactor. Regents of the University of Minnesota, Kinney & Lange, June 2, 1987: US04670135 (63 worldwide citation)

A high volume virtual impactor for sampling atmospheric aerosols has a plurality of inlet nozzles and associated receiving tubes mounted in a common frame or housing having passageways which divide the airflow through the inlet nozzles into a major flow and a minor flow. The minor flow, or the small ...


3
Benjamin Y H Liu, Thuc M Dinh, William D Dick, Aaron M Collins, Francisco J Romay: Apparatus for counting particles in a gas. MSP Corporation, Westman Champlin & Koehler P A, Z Peter Sawicki, Amanda Prose, April 29, 2014: US08711338 (62 worldwide citation)

The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber ...


4
Benjamin Y H Liu, James J J Sun: High output PSL aerosol generator. MSP Corporation, Westman Champlin & Kelly P A, March 11, 1997: US05609798 (56 worldwide citation)

An atomizer includes a housing that has a plurality of atomizing nozzles which will atomize a solution containing small particles that are to be carried in an output aerosol. The atomizer nozzles are surrounded by a ring-like surface against which the atomized material impinges to collect large drop ...


5
Benjamin Y H Liu, Kang H Ahn: Process for surface and fluid cleaning. Regents of the University of Minnesota, Merchant Gould Smith Edell Welter & Schmidt, October 16, 1990: US04962776 (51 worldwide citation)

A cleaning system of the apparatus utilizing the effect of surface tension forces (4) and phase changes between a liquid and gas. In one embodiment the surface (21) to be cleaned is submerged within a vessel (30), the pressure within the vessel being increased. A rapid depressurization of the vessel ...


6
Virgil A Marple, Benjamin Y H Liu: Impactor apparatus. The Regents of the University of Minnesota, Burd Bartz & Gutenkauf, March 30, 1982: US04321822 (41 worldwide citation)

An impactor apparatus operable to collect particles for subsequent gravimetric or chemical analysis. The apparatus has a first assembly for supporting particle impaction means and a second nozzle assembly releasably mounted on the first assembly having nozzle means for directing gas and particles to ...


7
Benjamin Y H Liu, James J Sun: Compact electrostatic precipitator for droplet aerosol collection. MSP Corporation, Westman Champlin & Kelly P A, April 24, 2001: US06221136 (38 worldwide citation)

An electrostatic precipitator has a high voltage electrode including multiple wire segments that are positioned within a surrounding electrically conductive porous media having a central axis and wherein the electrode assembly extends along the central axis. The electrode assembly has a plurality of ...


8
Virgil A Marple, Benjamin Y H Liu: High volume PM.sub.10 sampling inlet. Regents of the University of Minnesota, Kinney & Lange, August 20, 1991: US05040424 (36 worldwide citation)

A sampling inlet for sampling aerosols in atmospheric air comprises an inlet housing that has an air flow and an inertial particle classification device in a series flow path from an inlet opening in the sampler to a filter which collects the material. The sampler is a classification device of the v ...


9
James J Sun, Benjamin Y H Liu, Virgil A Marple: Method and apparatus for thin film deposition on large area substrates. MSP Corporation, Westman Champlin & Kelly P A, February 26, 2002: US06349668 (35 worldwide citation)

A thin film deposition apparatus is used for applying thin films onto substrates, such as large panel displays, as well as integrated circuit devices, and includes a source of an ionized gas that is intermixed with an aerosol prior to deposition. The ionized gas causes the aerosol particles to take ...


10
Benjamin Y H Liu, Virgil A Marple: Particle concentrating sampler. Regents of the University of Minnesota, Kinney & Lange, November 27, 1990: US04972957 (34 worldwide citation)

A particle concentrating sampler utilizes a virtual impactor, which is an inertial classifier, for concentrating airborne particles above a cut size into a smaller volume air. The concentrated particles are counted, or collected on impactor plates or by using other collection techniques, such as fil ...