1
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


2
Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects. ASML Netherlands, Pillsbury Winthrop, April 20, 2004: US06724460 (28 worldwide citation)

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the ...


3
Levinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer: Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system. ASML Netherlands, Carl Zeiss SMT, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07116394 (16 worldwide citation)

A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component ...


4
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, December 7, 2004: US06828569 (14 worldwide citation)

Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected fro ...


5
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07115886 (2 worldwide citation)

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the ...


6
Johannes Henricus Wilhelmus Jacobs, Vadim Yevgenyevich Banine, Barrie Dudley Brewster, Vladimir Vitalevitch Ivanov, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Robert Gordon Livesey, Bastiaan Theodoor Wolschrijn: Lithographic device, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 23, 2010: US07684012 (1 worldwide citation)

A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases ...


7
Marc Hubertus Lorenz Van Der Velden, Vadim Yevgenyevich Banine, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Markus Weiss, Bastiaan Theodoor Wolschrijn, Michiel D Nijkerk: Lithographic apparatus, system and device manufacturing method. ASML Netherlands, Carl Zeiss SMT, Pillsbury Winthrop Shaw Pittman, February 17, 2009: US07491951 (1 worldwide citation)

The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiat ...


8
Erik Leonardus Ham, Gert Jan Heerens, Robert Gabriƫl Maria Lansbergen, Ellard Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors: Lithographic apparatus and patterning device transport. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 19, 2006: US07151589 (1 worldwide citation)

According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the t ...


9
Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans, Givi Georgievitch Zukavishvili, Bastiaan Theodoor Wolschrijn, Marc Hubertus Lorenz Van Der Velden: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 9, 2007: US07279690 (1 worldwide citation)

A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward t ...


10
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital aposevitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. Asml Netherlands, Pillsbury Winthrop, October 24, 2002: US20020154279-A1 (1 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...