1
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, Lyons Christopher F, Babcock Carl P, Kye Jongwook, DRAKE Paul S, July 7, 2005: WO/2005/062128 (354 worldwide citation)

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


2
Kye Jongwook, Babcock Carl P, Lyons Christopher F: Pellicle for a lithographic lens. Advanced Micro Devices, Kye Jongwook, Babcock Carl P, Lyons Christopher F, DRAKE Paul S, September 15, 2005: WO/2005/085956 (2 worldwide citation)

Disclosed are a method and apparatus for preventing contamination in a lithographic apparatus (10) including a projection system (24). The lithographic apparatus (10) images an irradiated portion of a mask (22) onto a target portion (40) of a substrate (28). A pellicle (32, 36) is placed with respec ...


3
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, August 23, 2006: GB2423374-A

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


4

5
Babcock Carl P: Method and evaporating solution for rinsing a developed photoresist layer. Advanced Micro Devices, December 10, 2003: EP1368824-A1

A method of developing a photoresist layer (30) on a semiconductor wafer (22) in a developing chamber (20) includes applying a developer to the photoresist layer (30), applying an evaporating solution (32) to the photoresist layer (30), and drying the wafer (22).


6
Babcock Carl P: Method and evaporating solution for rinsing a developed photoresist layer. Advanced Micro Devices, RODDY Richard J, September 19, 2002: WO/2002/073677

A method of developing a photoresist layer (30) on a semiconductor wafer (22) in a developing chamber (20) includes applying a developer to the photoresist layer (30), applying an evaporating solution (32) to the photoresist layer (30), and drying the wafer (22).


7
Tabery Cyrus E, Lukanc Todd P, Haidinyak Chris, Capodieci Luigi, Babcock Carl P, Kim Hung Eil, Spence Christopher A: System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques. Advanced Micro Devices, Tabery Cyrus E, Lukanc Todd P, Haidinyak Chris, Capodieci Luigi, Babcock Carl P, Kim Hung Eil, Spence Christopher A, DRAKE Paul S, November 3, 2005: WO/2005/104189

A method of selecting a plurality of lithography process parameters for patterning a layout (300) on a wafer includes simulating (310) how the layout will print on the wafer for a plurality of resolution enhancement techniques (RETs), where each RET corresponds to a plurality of lithography process ...


8
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, ge bo cheng wei, December 27, 2006: CN200480035404

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


9
Babcock Carl P: System and method for developing a photoresist layer with reduced pattern collapse. Advanced Micro Devices, January 11, 2006: TWI247336

A method of developing a photoresist layer (30) on a semiconductor wafer (22) in a developing chamber (20) includes applying a developer to the photoresist layer (30), applying an evaporating solution (32) to the photoresist layer (30), and drying the wafer (22).


10
Lyons Christopher F, Babcock Carl P, Kye Jong Wook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, December 1, 2006: KR1020067011092

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...



Click the thumbnails below to visualize the patent trend.